公开(公告)号：US10428271B2

公开(公告)日：2019-10-01

申请号：US14914418

申请日：2014-08-28

Applicant: Entegris, Inc.

Inventor： Emanuel I. Cooper ,  Li-Min Chen ,  Steven Lippy ,  Chia-Jung Hsu ,  Sheng-hung Tu ,  Chieh Ju Wang

IPC: C09K13/00 ,  C09K13/06 ,  H01L21/311 ,  H01L21/3213

Abstract: Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant, one etchant, and one activator to enhance the etch rate of titanium nitride.