SEMICONDUCTOR TREATMENT LIQUID, TREATMENT METHOD FOR OBJECT TO BE TREATED, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

    公开(公告)号:US20250129308A1

    公开(公告)日:2025-04-24

    申请号:US19005399

    申请日:2024-12-30

    Abstract: An object of the present invention is to provide a semiconductor treatment liquid which has excellent anticorrosion properties against at least one metal selected from the group consisting of Cu and Co in a case of being brought into contact with an object containing the metal, and also has excellent cleanability for organic residues on a surface of the object to be treated; and to provide a treatment method for an object to be treated and a manufacturing method of an electronic device. The treatment liquid of the present invention contains a purine compound and an amine compound, in which the purine compound includes at least one selected from the group consisting of purine and a purine derivative, the amine compound includes at least two of one amine compound A and one or two or more amine compounds B different from the amine compound A, the amine compound A is a tertiary amine compound, and a mass ratio of a content of the purine compound to a content of the amine compound is 0.0001 to 0.1.

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