公开(公告)号：US20190070707A1

公开(公告)日：2019-03-07

申请号：US16074668

申请日：2017-02-20

Applicant: FUJIMI INCORPORATED

Inventor： Toru KAMADA ,  Koji KATAYAMA ,  Hitoshi MORINAGA ,  Takashi HORIBE

IPC: B24B37/22 ,  B24D13/14 ,  B24B29/02 ,  B24B37/24 ,  B24B37/26

Abstract: A disc-shaped polishing pad (1) is used for a polishing method of the present invention. The polishing pad (1) has a peripheral surface (111) on a polishing surface (10) side in an axial direction of the disc of a tapered surface whose diameter is reduced to the polishing surface (10). An angle formed by the peripheral surface (111) and the polishing surface (10) is 125° or more and less than 180°. The polishing pad (1) has a hardness immediately after a pressing surface is in close contact of 40 or more by a testing method specified in an appendix 2 of JIS K7312: 1996, “Spring Hardness Test Type C Testing Method”. A slurry containing abrasives is supplied to a polished surface larger than the polishing surface (10). The polishing surface (10) is pressed against the polished surface and the polishing pad (1) is moved to polish the polished surface.