公开(公告)号：US20150040970A1

公开(公告)日：2015-02-12

申请号：US14452306

申请日：2014-08-05

Applicant: First Solar, Inc.

Inventor： Raffi Garabedian ,  Roger Malik ,  Jeremy Theil ,  Jigish Trivedi ,  Ming Yu

IPC: H01L31/0304 ,  C23C16/22 ,  H01L21/64 ,  H01L31/18

CPC classification number: H01L31/0304 ,  C23C14/243 ,  C23C14/568 ,  C23C16/22 ,  H01L21/02546 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262 ,  H01L21/64 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/03046 ,  H01L31/0693 ,  H01L31/18 ,  H01L31/184 ,  H01L2221/67 ,  Y02E10/544 ,  Y02P70/521

Abstract: An inline vacuum deposition system contains thermal source pairs configured in adjacent deposition zones. Dopant sources allow the electrical characteristics of the sequentially formed layers to be controlled for a preferred deposition growth profile.

Abstract translation: 在线真空沉积系统包含配置在相邻沉积区中的热源对。 掺杂源允许顺序形成的层的电特性被控制用于优选的沉积生长曲线。