公开(公告)号：US20200294868A1

公开(公告)日：2020-09-17

申请号：US16298309

申请日：2019-03-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Hongliang SHEN ,  Guoxiang NING ,  Erfeng DING ,  Dongsuk PARK ,  Xiaoxiao ZHANG ,  Lan YANG

IPC: H01L21/66 ,  H01L27/02 ,  H01L27/088 ,  G06F17/50

Abstract: The present disclosure relates to a method which includes generating a device layout of an eBeam based overlay (EBO OVL) structure with a minimum design rule, simulating a worst case process margin for the generated device layout of the EBO OVL structure, enabling a plurality of devices for the simulated worst case process margin for the generated device layout of the EBO OVL structure, and breaking a plurality of design rules for the enabled plurality of devices of the EBO OVL structure to generate an OVL measurement layout of the EBO OVL structure.