公开(公告)号：US20220388032A1

公开(公告)日：2022-12-08

申请号：US17679906

申请日：2022-02-24

Applicant: GVD Corporation

Inventor： W. Shannan O'Shaughnessy ,  Scott W. Morrison ,  R. Austin Nowak

IPC: B05D1/00 ,  C23C16/50

Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.

公开(公告)号：US20190122884A1

公开(公告)日：2019-04-25

申请号：US16219514

申请日：2018-12-13

Applicant: GVD Corporation

Inventor： W. Shannan O'Shaughnessy ,  Scott W. Morrison ,  R. Austin Nowak

IPC: H01L21/02 ,  C08J5/18 ,  C08K5/14 ,  C08G77/04 ,  C23C16/505

Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.

公开(公告)号：US11679412B2

公开(公告)日：2023-06-20

申请号：US17679906

申请日：2022-02-24

Applicant: GVD Corporation

Inventor： W. Shannan O'Shaughnessy ,  Scott W. Morrison ,  R. Austin Nowak

IPC: C23C16/50 ,  B05D1/00

CPC classification number: B05D1/62 ,  B05D1/60 ,  C23C16/50

Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.

公开(公告)号：US20170358445A1

公开(公告)日：2017-12-14

申请号：US15621879

申请日：2017-06-13

Applicant: GVD Corporation

Inventor： W. Shannan O'Shaughnessy ,  Scott W. Morrison ,  R. Austin Nowak

IPC: H01L21/02 ,  C23C16/50

CPC classification number: H01L21/02274 ,  A61N1/00 ,  B05D1/62 ,  B05D2518/10 ,  C08G77/045 ,  C08J5/18 ,  C08J2383/07 ,  C08K5/14 ,  C23C16/401 ,  C23C16/50 ,  C23C16/505 ,  C23C2222/20 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02216

Abstract: Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.