公开(公告)号：US20100220958A1

公开(公告)日：2010-09-02

申请号：US12780601

申请日：2010-05-14

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/26 ,  G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US07936955B2

公开(公告)日：2011-05-03

申请号：US12780601

申请日：2010-05-14

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/26

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本上相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US07359607B2

公开(公告)日：2008-04-15

申请号：US10929271

申请日：2004-08-30

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US08111965B2

公开(公告)日：2012-02-07

申请号：US13099126

申请日：2011-05-02

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US07720341B2

公开(公告)日：2010-05-18

申请号：US12047927

申请日：2008-03-13

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US20080226247A1

公开(公告)日：2008-09-18

申请号：US12047927

申请日：2008-03-13

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US07006746B2

公开(公告)日：2006-02-28

申请号：US10233000

申请日：2002-08-29

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtej Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US20110206332A1

公开(公告)日：2011-08-25

申请号：US13099126

申请日：2011-05-02

申请人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtel Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

发明人： Guy T. Blalock ,  Howard E. Rhodes ,  Vishnu K. Agarwal ,  Gurtel Singh Sandhu ,  James S. Foresi ,  Jean-Francois Viens ,  Dale G. Fried

IPC分类号： G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。

公开(公告)号：US06912331B2

公开(公告)日：2005-06-28

申请号：US10096297

申请日：2002-03-12

申请人： Dale G. Fried ,  Jean-Francois Viens ,  James S. Foresi ,  Maksim A Skorobogatiy ,  Michael H. Lim

发明人： Dale G. Fried ,  Jean-Francois Viens ,  James S. Foresi ,  Maksim A Skorobogatiy ,  Michael H. Lim

IPC分类号： G02B6/10 ,  G02B6/12 ,  G02B6/124 ,  G02B6/126

CPC分类号： G02B6/126 ,  G02B6/10 ,  G02B6/105 ,  G02B6/124 ,  G02B2006/12107 ,  G02B2006/12116

摘要： By judicious engineering of grating parameters such as tooth shape, duty cycle and phase offset, the grating strengths and effective indices of the polarization modes of a grated waveguide are adjusted over a wide range of values to achieve a desired level of polarization sensitivity, or insensitivity. In the typical example, the physical geometry of the grating teeth is adjusted so that degenerate behavior (nTE=nTM and κTE=κTM) is obtained for two polarization modes; the effective refractive indices and grating strengths are matched for the TE and TM polarization modes. In the current embodiment the sidewall gratings are used in which the tooth profile is selected in order to equalize the grating strength for each polarization mode.

摘要翻译： 通过对诸如齿形，占空比和相位偏移之类的光栅参数进行明智的工程，可以在宽范围的数值范围内调整格栅波导的光栅强度和有效折射率，以达到所需的偏振灵敏度或不敏感度 。 在典型的示例中，调整光栅齿的物理几何形状，使得简并行为（n N T TE N N T T N T N T N T T N T T 获得两种偏振模式的 对于TE和TM偏振模式，有效折射率和光栅强度匹配。 在当前实施例中，使用侧壁光栅，其中选择齿廓以便均衡每个偏振模式的光栅强度。

公开(公告)号：US20050031284A1

公开(公告)日：2005-02-10

申请号：US10929271

申请日：2004-08-30

申请人： Guy Blalock ,  Howard Rhodes ,  Vishnu Agarwal ,  Gurtej Sandhu ,  James Foresi ,  Jean-Francois Viens ,  Dale Fried

发明人： Guy Blalock ,  Howard Rhodes ,  Vishnu Agarwal ,  Gurtej Sandhu ,  James Foresi ,  Jean-Francois Viens ,  Dale Fried

IPC分类号： G02B6/12 ,  G02B6/125 ,  G02B6/136 ,  G02F1/01 ,  G02F1/025 ,  G02B6/10

CPC分类号： G02F1/025 ,  G02B6/125 ,  G02B6/136 ,  G02B2006/12107 ,  G02B2006/12164 ,  G02F1/0147 ,  G02F2203/15

摘要： A waveguide and resonator are formed on a lower cladding of a thermo optic device, each having a formation height that is substantially equal. Thereafter, the formation height of the waveguide is attenuated. In this manner, the aspect ratio as between the waveguide and resonator in an area where the waveguide and resonator front or face one another decreases (in comparison to the prior art) thereby restoring the synchronicity between the waveguide and the grating and allowing higher bandwidth configurations to be used. The waveguide attenuation is achieved by photomasking and etching the waveguide after the resonator and waveguide are formed. In one embodiment the photomasking and etching is performed after deposition of the upper cladding. In another, it is performed before the deposition. Thermo optic devices, thermo optic packages and fiber optic systems having these waveguides are also taught.

摘要翻译： 波导和谐振器形成在热光器件的下包层上，每个具有基本相等的形成高度。 此后，波导的形成高度被衰减。 以这种方式，波导和谐振器在波导和谐振器前面或彼此面对的区域（与现有技术相比）中的波导和谐振器之间的纵横比，从而恢复波导和光栅之间的同步性并允许更高的带宽配置 要使用的。 在形成谐振器和波导之后，通过光掩模和蚀刻波导来实现波导衰减。 在一个实施例中，在沉积上部包层之后进行光掩模和蚀刻。 另一方面，它是在沉积之前进行的。 还教导了具有这些波导的热光器件，热光封装和光纤系统。