摘要:
The invention is directed to a process and more particularly, to utilizing polymer solutions to make thick film compositions. In one embodiment the process is directed to the formation of photoimageable thick film compositions for use in photo-patterning methods to make photoimageable electrodes in flat panel display applications, including plasma display panels (PDP). Polymer solutions are obtained by directly polymerizing desired monomers in a desired solvent to form a desired polymer, rather than by dissolving a pre-made polymer in a desired solvent. Other ingredients are added to the polymer solution to directly form thick film pastes, including photoimageable thick film pastes.
摘要:
This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.
摘要:
The invention is directed to a process for making screen-printable getter composition comprising: (a) glass frit; and (b) pre-hydrated desiccant material; dispersed in (c) organic medium. The desiccant material is pre-hydrated to reach its saturation level of moisture absorption. The process of pre-hydration can be done by exposing the desiccant in a normal temperature/humidity environment of for example, 25° C. and 50-60% RH. For 24 to 48 hours or up to the time when weight gain (due to moisture absorption) stops increasing. An accelerated hydration process in a chamber with higher than normal humidity level (i.e. 50% Relative Humidity) is also applicable to shorten the time of exposure to fully hydrate the desiccant material.
摘要:
The invention is directed to a process for making screen-printable getter composition comprising: (a) glass frit; and (b) pre-hydrated desiccant material; dispersed in (c) organic medium. The present invention further relates to a getter composition utilizing low-softening temperature glasses comprising, based on weight %, 1-50% SiO2, 0-80% B2O3, 0-90% Bi2O3, 0-90% PbO, 0-90% P2O5, 0-60% Li2O, 0-30% Al2O3, 0-10% K2O, 0-10% Na2O, and 0-30% MO where M is selected from Ba, Sr, Ca, Zn, Cu, Mg and mixtures thereof. The glasses described herein may contain several other oxide constituents that can substitute glass network-forming elements or modify glass structure.The desiccant material is pre-hydrated to reach its saturation level of moisture absorption. The process of pre-hydration can be done by exposing the desiccant in a normal temperature/humidity environment of for example, 25° C. and 50-60% RH. For 24 to 48 hours or up to the time when weight gain (due to moisture absorption) stops increasing. An accelerated hydration process in a chamber with higher than normal humidity level (i.e. 50% Relative Humidity) is also applicable to shorten the time of exposure to fully hydrate the desiccant material.
摘要翻译:本发明涉及一种制备可印版吸气剂组合物的方法,包括:(a)玻璃料; 和(b)预水化干燥剂材料; 分散在(c)有机介质中。 本发明还涉及一种使用低软化温度的玻璃的吸气剂组合物,该组合物的重量百分数为1-50%SiO 2,0-80%B 2 O 3,0-90%Bi 2 O 3,0-90%PbO,0-90% P 2 O 5,0-60%Li 2 O,0-30%Al 2 O 3,0-10%K 2 O,0-10%Na 2 O和0-30%MO,其中M选自Ba,Sr,Ca,Zn,Cu,Mg和混合物 其中。 本文所述的玻璃可以包含可以代替玻璃网络形成元件或改变玻璃结构的几种其它氧化物成分。 干燥剂材料预水合以达到其饱和吸湿水平。 预水合的过程可以通过在例如25℃和50-60%RH的常温/湿度环境中暴露干燥剂来进行。 24至48小时或直至体重增加(由于吸湿)停止增加的时间。 具有高于正常湿度水平(即50%相对湿度)的室中的加速水化过程也适用于缩短暴露于充分水合干燥剂材料的时间。
摘要:
This invention is directed to a process for the fabrication of features on a silicon wafer utilizing fibers or ribbons comprising organic polymer and inorganic material.
摘要:
This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.
摘要:
This invention is directed to a process for the fabrication of features on a silicon wafer utilizing ribbons comprising organic polymer and inorganic material.