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公开(公告)号：US5656141A
公开(公告)日：1997-08-12
申请号：US607273
申请日：1996-02-20
申请人： Hans-Georg Betz , Gregor A. Campbell , Robert W. Conn , Karl Matl , Peter Sommerkamp , Alfons Zoeller , Dan M. Goebel
发明人： Hans-Georg Betz , Gregor A. Campbell , Robert W. Conn , Karl Matl , Peter Sommerkamp , Alfons Zoeller , Dan M. Goebel
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/50 , C23C14/505 , H01J37/32027 , H01J37/3266 , H01J2237/3137
摘要： Apparatus for coating substrates 31, 31", . . . in a vacuum chamber 2 including a substrate carrier 30 disposed therein and a device 29 for generating a first plasma cloud 28 and, further, including magnets 26, 27 directing the plasma cloud 28 onto the surface of the substrates 31, 31" . . . wherein this device for generating the plasma cloud 28 has an election emitter 11 and a downstream tubular anode 38, the anode has an inlet 10 for the process gas to ignite the plasma and, further, the device is provided with magnets 4, 7 for directing and guiding the plasma through the anode tube 38 into the process chamber 43 and including a device for generating atoms, molecules or clusters of the materials for producing a layer on the substrates 31, 31", . . . , preferably an electron beam evaporator 37 from which the evaporated or sputtered material 33 can be directly applied onto the substrates 31, 31" . . . . A second plasma 60 is generated between the crucible 45 of the electron beam evaporator 37 and the anode tube 38 of the plasma source 29 by applying a potential difference between the plasma source 29 and the vacuum chamber 2.
摘要翻译： 用于涂覆基底31,31“的装置。 。 。 在包括设置在其中的基板载体30的真空室2和用于产生第一等离子体云28的装置29中，还包括将等离子体云28引导到基板31,31“的表面上的磁体26,27。 。 。 其中用于产生等离子体云28的装置具有选择发射器11和下游管状阳极38，阳极具有用于工艺气体点燃等离子体的入口10，此外，该装置设置有用于引导的磁体4,7 并且将等离子体通过阳极管38引导到处理室43中，并且包括用于产生用于在基板31,31“上产生层的材料的原子，分子或簇的装置。 。 。 ，优选电子束蒸发器37，可以将蒸发的或溅射的材料33直接施加到基板31,31“上。 。 。 。 通过施加等离子体源29和真空室2之间的电位差，在电子束蒸发器37的坩埚45和等离子体源29的阳极管38之间产生第二等离子体60。
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公开(公告)号：US5597622A
公开(公告)日：1997-01-28
申请号：US177638
申请日：1994-01-04
申请人： Alfons Zoller , Karl Matl , Rainer Gotzelmann , Gunther Sauer
发明人： Alfons Zoller , Karl Matl , Rainer Gotzelmann , Gunther Sauer
摘要： The invention relates to a process of providing a scratch-resistant coating for a lens made of an optical material comprising synthetics. In order for the synthetic material, for example a CR 39, to be protected against scratches, a very thin adhesion layer of SiO is applied first, and is subsequently provided with a thick SiO.sub.2 layer. Both layers are deposited in a vacuum chamber which comprises both a thermal vaporizer for vaporizing the coating materials and a plasma source for irradiating the substrate simultaneously with application of the vaporized coating material.
摘要翻译： 本发明涉及一种提供由包含合成材料的光学材料制成的透镜的耐刮擦涂层的方法。 为了防止划伤的合成材料例如CR 39，首先施加非常薄的SiO的粘合层，并且随后设置有厚的SiO 2层。 两层沉积在真空室中，该真空室包括用于蒸发涂层材料的热蒸发器和用于在施加蒸发的涂层材料的同时照射衬底的等离子体源。
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