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公开(公告)号：US20080285060A1
公开(公告)日：2008-11-20
申请号：US11908204
申请日：2006-02-23
申请人： Alfons Zoller , Harro Hagedorn , Werner Klug
发明人： Alfons Zoller , Harro Hagedorn , Werner Klug
IPC分类号： G01B11/06
CPC分类号： C23C14/547 , G01B11/0683
摘要： The invention concerns a measuring system for optical monitoring of coating processes in a vacuum chamber, in which the light source is arranged inside the vacuum chamber between the substrate carrier and a shutter is arranged beneath the substrate carrier and the light-receiving unit is arranged outside the vacuum chamber in the optical path of the light source. The substrate carrier is designed to accept at least one substrate, and it can move across the coasting source in the vacuum chamber, preferably revolving about an axis, whereby the substrate or substrates cross(es) the optical path between the light source and the light-receiving unit for transmission measurement, and the shutter shades a measurement area across the coating source.
摘要翻译： 本发明涉及一种用于光学监测真空室中的涂布过程的测量系统，其中光源布置在基板载体和快门之间的真空室内部，布置在基板载体下方，光接收单元布置在外部 在光源的光路中的真空室。 衬底载体被设计成接受至少一个衬底，并且其可以在真空室中移动穿过滑动源，优选围绕轴线旋转，由此衬底或衬底跨越光源和光之间的光路 接收单元用于透射测量，并且快门遮蔽涂层源上的测量区域。
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公开(公告)号：US5597622A
公开(公告)日：1997-01-28
申请号：US177638
申请日：1994-01-04
申请人： Alfons Zoller , Karl Matl , Rainer Gotzelmann , Gunther Sauer
发明人： Alfons Zoller , Karl Matl , Rainer Gotzelmann , Gunther Sauer
摘要： The invention relates to a process of providing a scratch-resistant coating for a lens made of an optical material comprising synthetics. In order for the synthetic material, for example a CR 39, to be protected against scratches, a very thin adhesion layer of SiO is applied first, and is subsequently provided with a thick SiO.sub.2 layer. Both layers are deposited in a vacuum chamber which comprises both a thermal vaporizer for vaporizing the coating materials and a plasma source for irradiating the substrate simultaneously with application of the vaporized coating material.
摘要翻译： 本发明涉及一种提供由包含合成材料的光学材料制成的透镜的耐刮擦涂层的方法。 为了防止划伤的合成材料例如CR 39，首先施加非常薄的SiO的粘合层，并且随后设置有厚的SiO 2层。 两层沉积在真空室中，该真空室包括用于蒸发涂层材料的热蒸发器和用于在施加蒸发的涂层材料的同时照射衬底的等离子体源。
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公开(公告)号：US08184302B2
公开(公告)日：2012-05-22
申请号：US11908204
申请日：2006-02-23
申请人： Alfons Zoller , Harro Hagedorn , Werner Klug
发明人： Alfons Zoller , Harro Hagedorn , Werner Klug
IPC分类号： G01B11/28
CPC分类号： C23C14/547 , G01B11/0683
摘要： The invention concerns a measuring system for optical monitoring of coating processes in a vacuum chamber, in which the light source is arranged inside the vacuum chamber between the substrate carrier and a shutter is arranged beneath the substrate carrier and the light-receiving unit is arranged outside the vacuum chamber in the optical path of the light source. The substrate carrier is designed to accept at least one substrate, and it can move across the coasting source in the vacuum chamber, preferably revolving about an axis, whereby the substrate or substrates cross(es) the optical path between the light source and the light-receiving unit for transmission measurement, and the shutter shades a measurement area across the coating source.
摘要翻译： 本发明涉及一种用于光学监测真空室中的涂布过程的测量系统，其中光源布置在基板载体和快门之间的真空室内部，布置在基板载体下方，光接收单元布置在外部 在光源的光路中的真空室。 衬底载体被设计成接受至少一个衬底，并且其可以在真空室中移动穿过滑动源，优选围绕轴线旋转，由此衬底或衬底跨越光源和光之间的光路 接收单元用于透射测量，并且快门遮蔽涂层源上的测量区域。
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公开(公告)号：US20090214760A1
公开(公告)日：2009-08-27
申请号：US11885148
申请日：2006-02-23
CPC分类号： H01L21/67253 , B05B12/084 , B05C11/1005 , C23C14/547 , G01B5/066 , G01B11/0625 , G01B11/0683
摘要： The invention concerns an optical monitoring system for the measurement of layer thicknesses of thin coatings applied in a vacuum, particularly on moving substrates, during the coating process, in which the light intensity of the light of a light source injected into a reference light guide and released by a first piezoelectric or electrostrictive or magnetostrictive light chopper is registered by a light detector unit in a reference phase, the light of the light source in a measuring phase is injected into a first measuring light guide and the light released by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed to the substrate, and the light intensity of the light reflected or transmitted from the substrate is registered by the light detector unit through a second measuring light guide, and a remaining light intensity is registered by the light detector unit in at least one dark phase, wherein the reference phase, the measuring phase, and the dark phase are shifted in time by the light chopper and are digitally adjusted depending on the position of the substrate.
摘要翻译： 本发明涉及一种光学监测系统，用于在涂覆过程期间测量在真空中，特别是在移动的基板上施加的薄涂层的层厚度，其中注入到参考光导中的光源的光的光强度和 由第一压电或电致伸缩或磁致伸缩光斩波器释放由参考相位中的光检测器单元注入，测量相位中的光源的光被注入到第一测量光导中，并且由第二压电或 电致伸缩或磁致伸缩光斩波器被引导到基板，并且通过第二测量光导由光检测器单元记录从基板反射或透射的光的光强度，并且光检测器单元记录剩余光强度 在至少一个暗相中，其中参考相位，测量阶段和达尔 k相通过光斩波器在时间上移位，并且根据基板的位置进行数字调节。
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公开(公告)号：US4832490A
公开(公告)日：1989-05-23
申请号：US80428
申请日：1987-07-31
申请人： Michael Boos , Werner Klug , Alfons Zoller
发明人： Michael Boos , Werner Klug , Alfons Zoller
IPC分类号： G01N21/59 , G01B11/06 , G01J1/04 , G01J1/16 , G01J1/36 , G01J1/44 , G01J3/42 , G01N21/01 , G01N21/25 , G01N21/27 , G01N21/84
CPC分类号： G01J1/16 , G01B11/0616 , G01N21/255 , G01J2001/363 , G01J2001/4242 , G01J2001/4426 , G01J3/42 , G01N2021/1742 , G01N2021/8427 , G01N2201/082 , G01N2201/084 , G01N2201/12753
摘要： A photometer in which a measuring phase, a reference phase and a dark phase are produced by means of a chopper. These phases are staggered in time, so that a single detector can be provided for all phases. In the photometer the object to be measured is situated between two light conductors, the one light conductor leading to the detector and the other light conductor leading to the chopper input. The chopper output is carried by an additional light conductor to the detector.
摘要翻译： 其中通过斩波器产生测量相位，参考相位和暗相位的光度计。 这些阶段在时间上交错，因此可以为所有阶段提供单个检测器。 在光度计中，要测量的物体位于两个光导体之间，一个光导体通向检测器，另一个光导体通向斩波器输入。 斩波器输出由附加的光导体携带到检测器。
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公开(公告)号：US09679793B2
公开(公告)日：2017-06-13
申请号：US11885148
申请日：2006-02-23
CPC分类号： H01L21/67253 , B05B12/084 , B05C11/1005 , C23C14/547 , G01B5/066 , G01B11/0625 , G01B11/0683
摘要： The invention concerns an optical monitoring system for the measurement of layer thicknesses of thin coatings applied in a vacuum, particularly on moving substrates, during the coating process, in which the light intensity of the light of a light source injected into a reference light guide and released by a first piezoelectric or electrostrictive or magnetostrictive light chopper is registered by a light detector unit in a reference phase, the light of the light source in a measuring phase is injected into a first measuring light guide and the light released by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed to the substrate, and the light intensity of the light reflected or transmitted from the substrate is registered by the light detector unit through a second measuring light guide, and a remaining light intensity is registered by the light detector unit in at least one dark phase, wherein the reference phase, the measuring phase, and the dark phase are shifted in time by the light chopper and are digitally adjusted depending on the position of the substrate.
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7.发明授权公开(公告)号：US06549291B1
公开(公告)日：2003-04-15
申请号：US09655222
申请日：2000-09-05
申请人： Torsten Dieter , Rudolf Beckman , Alfons Zoller , Harro Hagedorn
发明人： Torsten Dieter , Rudolf Beckman , Alfons Zoller , Harro Hagedorn
IPC分类号： G01B1106
CPC分类号： G01B11/0633
摘要： Process for continuous determination of the optical layer thickness of coatings, which are applied on both sides of the spherical surfaces of concave convex lenses having different spherical radii R1 and R2. In this process a ray of light is beamed eccentrically during the coating process at each concave convex lens, and the reflection or transmission at the convex spherical surface and at the concave spherical surface is continuously measured with photodiodes, and the respective optical layer thickness is determined from the functional relationship between the reflection or the transmission and the optical layer thickness.
摘要翻译： 用于连续确定涂层的光学层厚度的方法，其施加在具有不同球形半径R1和R2的凹凸透镜的球面的两侧上。 在该过程中，在每个凹凸透镜的涂覆过程中，光线偏心地射出，并且用光电二极管连续地测量凸球面和凹球面处的反射或透射，并且确定相应的光学层厚度 从反射或透射与光学层厚度之间的功能关系。
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8.发明授权Vacuum coating apparatus with a crucible in the vacuum chamber to hold material to be evaporated 失效在真空室中具有坩埚的真空涂布装置，用于保持待蒸发的材料
公开(公告)号：US5888305A
公开(公告)日：1999-03-30
申请号：US741669
申请日：1996-10-31
CPC分类号： H01J37/3405 , C23C14/32 , H01J37/3053 , H01J2237/3137
摘要： A vacuum chamber contains a crucible (4) and an electron beam source (5) for evaporating material in the crucible. A substrate holder (6) holds substrates (7) above the crucible (4) with a process space therebetween. A magnetron cathode (11, 12) is located in each of two compartments (9, 10) located on either side of the process space. An aperture (21, 22) connects each compartment to the process space; each cathode (11, 12) carries a target (13, 14) facing away from the respective aperture (21, 22). The cathodes are connected to a medium frequency RF power supply (16), and process gas is supplied to the compartments by lines (17, 18).
摘要翻译： 真空室包含用于蒸发坩埚中的材料的坩埚（4）和电子束源（5）。 衬底保持器（6）在坩埚（4）上方具有处理空间的基板（7）。 磁控管阴极（11,12）位于位于处理空间两侧的两个隔间（9,10）的每一个中。 孔（21,22）将每个隔室连接到处理空间; 每个阴极（11,12）承载着面向远离相应孔（21,22）的靶（13,14）。 阴极连接到中频RF电源（16），并且处理气体通过管线（17,18）供应到隔间。
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9.发明授权
公开(公告)号：US4469713A
公开(公告)日：1984-09-04
申请号：US411238
申请日：1982-08-25
申请人： Horst Schwiecker , Alfons Zoller
发明人： Horst Schwiecker , Alfons Zoller
CPC分类号： G01B11/0633
摘要： An arrangement for measuring and controlling the thickness of optically transparent coatings during their build-up on substrates in vacuum coating installations. The measurement is carried out by determining at least one reference value and at least one measured value for the transmission or reflection value of the coated object by using a measuring light beam, a monochromator, a photo-receiver, an amplifier and an analyzing circuit.
摘要翻译： 用于测量和控制光学透明涂层在真空涂层装置中在基板上堆积时的厚度的装置。 通过使用测量光束，单色仪，光接收器，放大器和分析电路确定涂覆物体的透射或反射值的至少一个参考值和至少一个测量值来进行测量。
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