Abstract:
A METHOD OF RADIO FREQUENCY SPUTTERING LITHIUM NIOBATE THIN, SINGLE CRYSTAL FILMS HAVING BULK PROPERTIES IS DISCLOSED. THE SPUTTERING PROCESS IS PREFERABLY CARRIED OUT AT SUBSTRATE TEMPERATURES IN A RANGE OF 450*C. TO 870*C. THE SUBSTRATE IS PREFERABLY SINGLE CRYSTAL C OR A-A-AL2O3 OR MAY BE A SINGLE CRYSTAL OF GROWN LITHIUM NIOBATE. RADIO FREQUENCY POWERS IN THE RANGE OF 25 TO 150 WATTS FOR A FOUR-INCH DIAMETER CATHODE AND DEPOSITION RATES OF LESS THAN 0.4 A. PER SECOND MAY BE UTILIZED. ARGON PRESSURES DURING SPUTTERING ARE IN THE RANGE OF 25 MICRONS TO 44 MICRONS. THIN, SINGLE CRYSTAL FILMS UP TO 10,000 A. IN THICKNESS HAVE BEEN PRODUCED UTILIZING THE ABOVE SPUTTERING TECHNIQUE. THE RESULTING FILMS HAVE PROPERTIES SIMILAR TO CRYSTALS GROWN IN BULK.
Abstract:
A method is disclosed for sputtering epitaxially a layer of stoichiometric garnet composition from a single target wherein the target is composed of a mixture of the separate components of the sputtered layer. Illustratively, both at a substrate temperature of approximately 450*C and at another substrate temperature between 800-850*C, there was obtained formation of a film of gallium substituted yttrium iron garnet (Ga:YIG). A target was made up of the desired stoichiometry with a mixture of the individual oxides pressed to 85% of the compound''s theoretical density. Generally, the steps of the method are: (1) applying a radiofrequency bias to the substrate during sputtering to prevent the deposition of an easily resputtered component of the target; and (2) changing the power density to the target during deposition. Specifically, a target was made up of a mixture of individual oxides Y2O3 + Ga2O3 + Fe2O3 which was pressed to 85% of its theoretical density. Exemplary films of stoichiometric composition were obtained with a radio-frequency bias on the substrate in the range approximately from ground to 100 volts and with power density to the target in the range of approximately 5 to 65 watts/in2. The stoichiometric ratio for the composition was Y3Fe(5 x)GaxO12, where 0
Abstract:
A mask for the manufacture of semiconductor and other very small components. The mask is comprised of patterns of multi-component oxides and fluorides, such as spinels, perovskites, and garnets. In general, the materials are harder than the components being manufactured and are opaque to the wavelength used in photoresist techniques, while being transparent to the visible wavelengths. Materials with an energy gap between approximately 2.8 eV and 5 eV satisfy these optical properties, a particular example being GaFeO3. These masks are not damaged by surface defects on the components and can be visually aligned.
Abstract:
Electric field controllable devices which operate on the principle of velocity change of a wave passing therethrough. These waves can be magneto-elastic or spin waves, including surface waves. The materials used in these devices include Ga2 xFexO3, Cr2O3, and YIG. When the electric field across the device is changed, the cyclotron resonance frequency of the device is greatly shifted, resulting in wave velocity changes up to about 50 percent. A bias magnetic field is generally applied across the devices to establish a resonance frequency. Devices include variable delays, modulators, frequency translators, wave guides, tunable filters, etc.
Abstract:
An integrated acoustic surface wave device is provided by this disclosure wherein a piezoelectric field associated with an acoustic surface wave causes a material adjacent to the surface to transform from one physical state to another physical state. The changes in state due to the presence of the piezoelectric wave are utilized to detect, amplify and store information. The presence of the piezoelectric wave controls external physical quantities, e.g., voltage and current, for information processing and storage. In particular, an amorphous semiconducting material is deposited on the surface of a piezoelectric surface wave acoustic delay line at a location where the presence of the traversing piezoelectric wave is to be detected. Contact electrodes are provided on the amorphous material and are connected to an external electrical circuit wherein there is a voltage source and a load means. The voltage source provides an electric field in the amorphous material of a value below that necessary to achieve the threshold value for switching the material from a high-voltage and low-current state to a highcurrent and low-voltage state. In this manner, the piezoelectric field of the acoustic surface wave which transiently appears at the amorphous material when added to the externally applied electric field causes it to switch states and thereby gives rise to a pulse indication in the external electrical circuit. Accordingly, an integrated apparatus in accordance with this disclosure includes a piezoelectric surface wave delay line and an amorphous semiconductor film. A transducer on the surface of the piezoelectric crystal generates piezoelectric surface waves therein, and a local receiving transducer which serves as the electrodes for the amorphous semiconductor film intercepts the piezoelectric surface wave. The electric field associated with the surface wave supplements a bias electric field at the amorphous semiconductor film and causes the states thereof to switch and provides an indication of the presence of the piezoelectric wave in the external electric circuit connected to the amorphous film.