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公开(公告)号:US20250046589A1
公开(公告)日:2025-02-06
申请号:US18926803
申请日:2024-10-25
Applicant: INFICON AG
Inventor: Urs WÄLCHLI , Stefan KAISER , Bernhard ANDREAUS , Martin WÜEST , Astrid WALDNER , Michael TREFZER
Abstract: A chamber, for bounding a plasma generation area in a vacuum pressure sensor, includes an electrically conductive casing element located radially on an outside relative to a central axis. The chamber includes electrically conductive wall elements arranged substantially perpendicular to the central axis and connected to the electrically conductive casing element. At least one of the wall elements has a first opening, through which the central axis extends. The electrically conductive casing element comprises at least a first and a second region. The first region is located closer to the central axis than the second region. The electrically conductive casing element is conical at least in part.
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公开(公告)号:US20240194465A1
公开(公告)日:2024-06-13
申请号:US18431091
申请日:2024-02-02
Applicant: INFICON AG
Inventor: Urs WÄLCHLI , Stefan KAISER , Bernhard ANDREAUS , Martin WÜEST , Astrid WALDNER , Michael TREFZER
Abstract: Chamber (11, 12, 13) for bounding a plasma generation area (42) in a vacuum pressure sensor (40), wherein the chamber comprises an electrically conductive casing element (1, 1′, 1″) located radially on the outside relative to a central axis, wherein the chamber comprises electrically conductive wall elements (2, 2′, 2″) arranged substantially perpendicular to the central axis and connected to the casing element, wherein at least one of the wall elements has a first opening (3), through which the central axis extends, wherein the casing element comprises at least a first (B1) and a second region (B2), wherein the first region is located closer to the central axis than the second region. The invention further relates to a vacuum pressure sensor comprising the chamber.
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公开(公告)号:US20240196508A1
公开(公告)日:2024-06-13
申请号:US18285201
申请日:2022-03-21
Applicant: INFICON AG
Inventor: Bernhard ANDREAUS , Astrid WALDNER
CPC classification number: H05H1/2406 , G01L11/02 , G01N21/67
Abstract: A vacuum feedthrough (10) which is constructed in radial layers comprises the following elements (from inwards to outwards): —a lens element (11), —a first ring (12) made of glass, —a first hollow cylinder (13) made of a first dielectric material, —a first electrically conductive layer (18), —a second hollow cylinder (14) made of glass, —a third hollow cylinder (15) made of ceramic, —a second ring made of glass (16), and—a frame (17) made of metal. On the basis of the vacuum feedthrough, the invention additionally relates to an electrode assembly, to a device for generating a DBD plasma discharge, to a measuring device for characterizing a pressure and/or a gas composition, and to a method for operating the measuring device.
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公开(公告)号:US20240177979A1
公开(公告)日:2024-05-30
申请号:US18285042
申请日:2022-03-21
Applicant: INFICON AG
Inventor: Astrid WALDNER , Bernhard ANDREAUS , Urs WÄLCHLI , Stefan KAISER
CPC classification number: H01J37/32981 , H01J37/32018 , H01J37/32211 , H01J37/3244 , H01J37/32825 , H01J37/32972 , H01J37/3447
Abstract: The present invention relates to a device for plasma generation in a wide pressure range. The device comprises a first plasma source (1) in a first discharge chamber (2) in order to generate a first plasma in a low-pressure range, a second plasma source (3) in a second discharge chamber (4) in order to generate a second plasma in a high-pressure range, a first coupling element (5) for coupling the device to a system, in order to guide gas out of the system, and a second coupling element (6) for coupling the device to an optical sensor (12). The first discharge chamber (2) has a first optical connection with at least one optical lens (7, 8) to the second coupling element (6) and the second discharge chamber (4) has a second optical connection with at least one optical lens (8) to the second coupling element (6). This invention further relates to a system for optical gas analysis or gas detection and corresponding methods for plasma generation and for operating the system.
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