公开(公告)号：US20240177979A1

公开(公告)日：2024-05-30

申请号：US18285042

申请日：2022-03-21

Applicant: INFICON AG

Inventor： Astrid WALDNER ,  Bernhard ANDREAUS ,  Urs WÄLCHLI ,  Stefan KAISER

IPC: H01J37/32 ,  H01J37/34

CPC classification number: H01J37/32981 ,  H01J37/32018 ,  H01J37/32211 ,  H01J37/3244 ,  H01J37/32825 ,  H01J37/32972 ,  H01J37/3447

Abstract: The present invention relates to a device for plasma generation in a wide pressure range. The device comprises a first plasma source (1) in a first discharge chamber (2) in order to generate a first plasma in a low-pressure range, a second plasma source (3) in a second discharge chamber (4) in order to generate a second plasma in a high-pressure range, a first coupling element (5) for coupling the device to a system, in order to guide gas out of the system, and a second coupling element (6) for coupling the device to an optical sensor (12). The first discharge chamber (2) has a first optical connection with at least one optical lens (7, 8) to the second coupling element (6) and the second discharge chamber (4) has a second optical connection with at least one optical lens (8) to the second coupling element (6). This invention further relates to a system for optical gas analysis or gas detection and corresponding methods for plasma generation and for operating the system.

公开(公告)号：US20250046589A1

公开(公告)日：2025-02-06

申请号：US18926803

申请日：2024-10-25

Applicant: INFICON AG

Inventor： Urs WÄLCHLI ,  Stefan KAISER ,  Bernhard ANDREAUS ,  Martin WÜEST ,  Astrid WALDNER ,  Michael TREFZER

IPC: H01J41/10 ,  G01L21/30 ,  H01J41/02

Abstract: A chamber, for bounding a plasma generation area in a vacuum pressure sensor, includes an electrically conductive casing element located radially on an outside relative to a central axis. The chamber includes electrically conductive wall elements arranged substantially perpendicular to the central axis and connected to the electrically conductive casing element. At least one of the wall elements has a first opening, through which the central axis extends. The electrically conductive casing element comprises at least a first and a second region. The first region is located closer to the central axis than the second region. The electrically conductive casing element is conical at least in part.

公开(公告)号：US20240194465A1

公开(公告)日：2024-06-13

申请号：US18431091

申请日：2024-02-02

Applicant: INFICON AG

Inventor： Urs WÄLCHLI ,  Stefan KAISER ,  Bernhard ANDREAUS ,  Martin WÜEST ,  Astrid WALDNER ,  Michael TREFZER

IPC: H01J41/10 ,  G01L21/30

CPC classification number: H01J41/10 ,  G01L21/30

Abstract: Chamber (11, 12, 13) for bounding a plasma generation area (42) in a vacuum pressure sensor (40), wherein the chamber comprises an electrically conductive casing element (1, 1′, 1″) located radially on the outside relative to a central axis, wherein the chamber comprises electrically conductive wall elements (2, 2′, 2″) arranged substantially perpendicular to the central axis and connected to the casing element, wherein at least one of the wall elements has a first opening (3), through which the central axis extends, wherein the casing element comprises at least a first (B1) and a second region (B2), wherein the first region is located closer to the central axis than the second region. The invention further relates to a vacuum pressure sensor comprising the chamber.

公开(公告)号：US20220334016A1

公开(公告)日：2022-10-20

申请号：US17762019

申请日：2019-09-20

Applicant: INFICON AG

Inventor： Carsten STRIETZEL ,  Urs WÄLCHLI ,  Stefan KAISER ,  Christian RIESCH ,  Bernhard ANDREAUS ,  Mario WEDER

IPC: G01L21/34

Abstract: The invention relates to a method 100 for determining a pressure in a vacuum system, wherein the method comprises the steps of: a) generating 101 a plasma in a sample chamber which is fluid-dynamically connected to the vacuum system and which is in electrical contact with a first electrode and a second electrode; b) measuring 102 a current intensity of an electrical current flowing through the plasma between the first electrode and the second electrode; c) measuring 103 a first radiation intensity of electromagnetic radiation of a first wavelength range which is emitted from the plasma, wherein the first wavelength range contains at least a first emission line of a first plasma species of a first chemical element; d) measuring 104 a second radiation intensity of electromagnetic radiation of a second wavelength range which is emitted from the plasma, wherein the second wavelength range contains a second emission line of the first plasma species of the first chemical element or of a second plasma species of the first chemical element, and wherein the second emission line is outside the first wavelength range; and e) determining 105 the pressure in the vacuum system as a function of the measured current intensity, the measured first radiation intensity, and the measured second radiation intensity. Further, the invention relates to a vacuum pressure sensor.