公开(公告)号：US20140160457A1

公开(公告)日：2014-06-12

申请号：US14099263

申请日：2013-12-06

Applicant: InnoLux Corporation

Inventor： Ker-Yih KAO ,  Tsan-Jen CHEN ,  Chien-Hsing LEE

IPC: G03F7/26

CPC classification number: G03F7/70775 ,  G03F7/201 ,  G03F7/26

Abstract: A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.

Abstract translation: 显示器制造方法包括以下步骤：通过输送装置移动第一基板和第二基板; 以及当所述输送装置驱动所述第一和第二基板通过所述光源模块时，通过至少一个发光元件实施所述第一基板的第一曝光和第二曝光以及所述第二基板的第一曝光和第二曝光。 当实现第一和第二基板的第一曝光时，第一和第二基板的移动方向相反，或者当实现第一和第二基板的第二次曝光时，第一和第二基板的移动方向相反 。 还公开了照相校准过程。

公开(公告)号：US20220179305A1

公开(公告)日：2022-06-09

申请号：US17681145

申请日：2022-02-25

Applicant: InnoLux Corporation

Inventor： Chien-Hsing LEE ,  Chin-Lung TING ,  Jung-Chuan WANG ,  Hong-Sheng HSIEH

IPC: G03F1/60

Abstract: A method for forming a target substrate is provided. The method includes providing a mask substrate. The method also includes providing a second base with a material layer. The method further includes arranging the mask substrate and the second base correspondingly. In addition, the method includes performing exposure and development processes on the material layer to form the target substrate and removing the mask substrate.

公开(公告)号：US20140368748A1

公开(公告)日：2014-12-18

申请号：US14281276

申请日：2014-05-19

Applicant: InnoLux Corporation

Inventor： Ker-Yih KAO ,  Tsan-Jen CHEN ,  Chen-Kuan KAO ,  Chien-Hsing LEE

IPC: G03F7/20

CPC classification number: G03F7/201

Abstract: A light exposure system executes a light exposure process to an assembly cell, which includes a first substrate, a second substrate and a liquid crystal layer disposed between the first and second substrates. The light exposure system comprises a transmission device, two moving stages and a light source module. The moving stages are disposed on the transmission device and at least one of the moving stages carries the assembly cell. The light source module includes at least a light emitting element. The transmission device moves at least one of the moving stages carrying the assembly cell or the light source module and the light emitting element emits the light to the assembly cell. A light exposure process applied to the light exposure system is also disclosed.

Abstract translation: 曝光系统对包括第一基板，第二基板和设置在第一和第二基板之间的液晶层的组装单元执行曝光处理。 曝光系统包括传输装置，两个移动台和光源模块。 移动台设置在传动装置上，并且至少一个移动台承载组装单元。 光源模块至少包括发光元件。 传输装置移动承载组装单元或光源模块的移动台中的至少一个，并且发光元件将光发射到组装单元。 还公开了应用于曝光系统的曝光过程。

公开(公告)号：US20210124257A1

公开(公告)日：2021-04-29

申请号：US16715929

申请日：2019-12-16

Applicant: InnoLux Corporation

Inventor： Chien-Hsing LEE ,  Chin-Lung TING ,  Jung-Chuan WANG ,  Hong-Sheng HSIEH

IPC: G03F1/60

Abstract: A method for forming a mask substrate is provided. The method includes providing a first base and providing a mask layer on the first base. The method also includes patterning the mask layer to form a pattern, wherein the first base and the pattern form a patterned substrate and providing a first substrate. The method further includes providing an optical layer on the first substrate or on the patterned substrate and assembling the first substrate and the patterned substrate to form the mask substrate.

公开(公告)号：US20180026374A1

公开(公告)日：2018-01-25

申请号：US15657345

申请日：2017-07-24

Applicant: InnoLux Corporation

Inventor： Huei-Ying CHEN ,  I-Yin LI ,  Chia-Chi HO ,  Hsu-Kuan HSU ,  Ker-Yih KAO ,  Chung-Kuang WEI ,  Chin-Lung TING ,  Cheng-Chi WANG ,  Chien-Hsing LEE

IPC: H01Q9/06 ,  H01Q9/04 ,  H01Q1/38

Abstract: An antenna device includes a first dielectric substrate, a first radiator disposed on the first dielectric substrate, a second dielectric substrate disposed on the first radiator, a second radiator disposed between the first dielectric substrate and the second dielectric substrate, a main radiator, disposed on the second dielectric substrate, and a modulation structure located between a first radiation portion of the first radiator and a second radiation portion of the second radiator. The first radiation portion, the modulation structure, and the second radiation portion are located in a central area.

公开(公告)号：US20240103356A1

公开(公告)日：2024-03-28

申请号：US18528914

申请日：2023-12-05

Applicant: InnoLux Corporation

Inventor： Chien-Hsing LEE ,  Chin-Lung TING ,  Jung-Chuan WANG ,  Hong-Sheng HSIEH

IPC: G03F1/60

CPC classification number: G03F1/60

Abstract: An electronic device is provided. The electronic device includes a base and a conductive layer that is disposed on the base and patterned by a plurality of processes. The plurality of processes include providing a mask substrate. The mask substrate includes a first substrate and a patterned substrate. In the cross-sectional view, the width of the first substrate is greater than or equal to the width of the patterned substrate. The plurality of processes include arranging the mask substrate and the base correspondingly. The plurality of processes also include performing exposure and development processes on the conductive layer for patterning the conductive layer, and removing the mask substrate.

公开(公告)号：US20160216617A1

公开(公告)日：2016-07-28

申请号：US15093499

申请日：2016-04-07

Applicant: Innolux Corporation

Inventor： Ker-Yih KAO ,  Tsan-Jen CHEN ,  Chien-Hsing LEE

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/201 ,  G03F7/26

Abstract: A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.

Abstract translation: 显示器制造方法包括以下步骤：通过输送装置移动第一基板和第二基板; 以及当所述输送装置驱动所述第一和第二基板通过所述光源模块时，通过至少一个发光元件实施所述第一基板的第一曝光和第二曝光以及所述第二基板的第一曝光和第二曝光。 当实现第一和第二基板的第一曝光时，第一和第二基板的移动方向相反，或者当实现第一和第二基板的第二次曝光时，第一和第二基板的移动方向相反 。 还公开了照相校准过程。