摘要:
In a method of forming a metal or metal nitride pattern, a metal or metal nitride layer is formed on a substrate, and a photoresist pattern is formed on the metal or metal nitride layer. An over-coating composition is coated on the metal or metal nitride layer and on the photoresist pattern to form a capping layer on the photoresist pattern. The over-coating composition includes a polymer having amine groups as a side chain or a branch and a solvent. A remaining portion of the over-coating composition is removed by washing with a hydrophilic solution. The metal or metal nitride layer is partially removed using the capping layer and the photoresist pattern as an etching mask.
摘要:
The capacitive pressure sensor comprises: a substrate functioning as a lower electrode; a first insulating film formed on the substrate; a cavity formed on the first insulating film; a second insulating film formed on the first insulating film to have openings communicated with the cavity and to cover the cavity; a sealing film formed of a conductive material to seal the openings and to extend partially into the cavity through the openings; and an upper electrode formed on the second insulating film to be electrically separated from the sealing film and to overlap the cavity.
摘要:
The capacitive pressure sensor comprises: a substrate functioning as a lower electrode; a first insulating film formed on the substrate; a cavity formed on the first insulating film; a second insulating film formed on the first insulating film to have openings communicated with the cavity and to cover the cavity; a sealing film formed of a conductive material to seal the openings and to extend partially into the cavity through the openings; and an upper electrode formed on the second insulating film to be electrically separated from the sealing film and to overlap the cavity.