公开(公告)号：US20230402297A1

公开(公告)日：2023-12-14

申请号：US18131099

申请日：2023-04-05

Applicant: KCTECH CO., LTD.

Inventor： Hyung Chul KIM ,  You Sun JUNG ,  Dong Min KIM

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67034 ,  H01L21/68785

Abstract: A substrate processing apparatus is disclosed. The substrate processing apparatus includes a chamber having a processing space in which substrate processing is performed therein, one or more exhaust lines connected to the chamber and configured to discharge a processing fluid from the processing space to an outside of the chamber, a supporting chuck disposed in the processing space, configured to support the substrate from below so that the substrate is disposed on an upper portion of the supporting chuck, and having an inner space configured to accommodate a first processing fluid, and one or more first supply lines configured to receive the first processing fluid from the outside of the chamber and transfer the first processing fluid to the inner space of the supporting chuck. In addition, various embodiments may be possible.

公开(公告)号：US20230260806A1

公开(公告)日：2023-08-17

申请号：US18012685

申请日：2021-05-28

Applicant: KCTECH CO., LTD.

Inventor： Dong Hwa LEE ,  Hyung Chul KIM ,  You Sun JUNG

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/66

CPC classification number: H01L21/67034 ,  H01L21/02068 ,  H01L21/6715 ,  H01L22/12 ,  H01L21/6719 ,  H01L21/67178

Abstract: A substrate processing system, according to one embodiment, comprises: a cleaning device, positioned at a first position, for performing a cleaning process for a substrate; a drying device, positioned at a second position, for performing a drying process for the substrate; and a transfer unit for transferring the substrate from the cleaning device to the drying device, wherein the first position and the second position may be vertically arranged.

公开(公告)号：US20230001462A1

公开(公告)日：2023-01-05

申请号：US17781700

申请日：2020-11-05

Applicant: KCTECH CO., LTD.

Inventor： Hyung Chul KIM ,  Dong Hwa LEE ,  You Sun JUNG

IPC: B08B13/00 ,  B08B7/00

Abstract: The substrate processing device according to one embodiment may comprise: a chamber unit provided with a processing space therein and comprising an inclined chamber surface having an opening; a door unit comprising an inclined door surface, which corresponds to the inclined chamber surface, and capable of being coupled to the chamber unit; and a door driving unit for driving the door unit so as to open/close the processing space.

公开(公告)号：US20220126328A1

公开(公告)日：2022-04-28

申请号：US17505185

申请日：2021-10-19

Applicant: KCTECH CO., LTD.

Inventor： Hyung Chul KIM ,  You Sun JUNG

IPC: B08B3/02 ,  B08B5/04

Abstract: A cleaning solution detection device includes a transfer part configured to unload and transfer a substrate having a surface to which a cleaning solution is applied when a cleaning process is completed, a detector configured to detect the cleaning solution that falls from the surface of the substrate in a process in which the substrate is unloaded and transferred by the transfer part, and a controller configured to determine whether a dangerous situation occurs due to a fall of the cleaning solution based on information detected by the detector.