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公开(公告)号:US11246247B2
公开(公告)日:2022-02-08
申请号:US16630104
申请日:2018-12-24
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Ho-Koang Choi , Byung Joon Moon , Dong Su Lee , Sukang Bae , Seoung-Ki Lee , Sang Hyun Lee , Tae-Wook Kim
Abstract: An electromagnetic wave shielding film includes a substrate; and an electromagnetic wave shielding layer disposed on the substrate and including a laminated structure having a planar shape and including a stack of metal nanoplates, wherein each metal nanoplate of the stack of metal nanoplates is staggered with respect to one or more other metal nanoplate of the stack of metal nanoplates so that the laminated structure has pores defined therein and between laminated structures in a stack of laminates structures. An additional embodiment of an electromagnetic wave shielding film includes an electromagnetic wave shielding layer including a composite of a polymer resin matrix composed of a polymer and at least one metal nanoplate, wherein each metal nanoplate of the at least one metal nanoplate is staggered with respect to one or more other metal nanoplate of the at least one metal nanoplate so that the composite has pores defined therein.
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公开(公告)号:US11801494B2
公开(公告)日:2023-10-31
申请号:US17271206
申请日:2019-11-06
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Sukang Bae , Seoung-Ki Lee , Dae-Young Jeon , Myung Jong Kim , Nam Dong Kim
IPC: B01J23/75 , B01J23/755 , B01J21/02 , B01J21/18 , B01J23/46 , B01J23/745 , B01J27/02 , B01J27/14 , B01J37/02
CPC classification number: B01J23/755 , B01J21/02 , B01J21/18 , B01J23/464 , B01J23/468 , B01J23/745 , B01J23/75 , B01J27/02 , B01J27/14 , B01J37/0215
Abstract: Provided is a method for manufacturing a single-atom catalyst supported on a carbon support, including treating a mixture of a precursor of a carbon support and a precursor of a hetero element other than carbon through a dry vapor phase process, thereby supporting, on a carbon support, a single-atom catalyst containing a hetero element other than carbon.
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公开(公告)号:US10915024B2
公开(公告)日:2021-02-09
申请号:US16032585
申请日:2018-07-11
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Sunbin Hwang , Dong Su Lee , Dae-Young Jeon , Sukang Bae , Seoung-Ki Lee , Sang Hyun Lee , Tae-Wook Kim
IPC: G03F7/20 , G03F7/24 , G03F7/00 , B32B5/00 , H01L21/027
Abstract: A fiber-type electronic device comprising a pattern for electronic devices stacked on a fiber filament substrate is provided. It is possible to manufacture an electronic device directly on a fiber filament substrate by applying the pattern for electronic devices. Thus, it can be widely used for wearable devices and the like. The pattern for electronic devices is manufactured by a method for forming a pattern for electronic devices comprising an exposure process using a maskless exposure apparatus. Thus, it is possible to manufacture a pattern for electronic devices on a fiber filament substrate through a continuous process and thus to increase the process efficiency.
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