Method for producing hexagonal boron nitride film using borazine oligomer as a precursor
    4.
    发明授权
    Method for producing hexagonal boron nitride film using borazine oligomer as a precursor 有权
    使用环硼氮烷低聚物作为前体制备六方氮化硼膜的方法

    公开(公告)号:US09562287B2

    公开(公告)日:2017-02-07

    申请号:US14082831

    申请日:2013-11-18

    Abstract: Provided is a method for producing a high-quality boron nitride film grown by using a borazine oligomer as a precursor through a metal catalyst effect. The method solves the problems, such as control of a gaseous precursor and vapor pressure control, occurring in CVD (Chemical vapor deposition) according to the related art, and a high-quality hexagonal boron nitride film is obtained through a simple process at low cost. In addition, the hexagonal boron nitride film may be coated onto various structures and materials. Further, selective coating is allowed so as to carry out coating in a predetermined area and scale-up is also allowed. Therefore, the method may be useful for coating applications of composite materials and various materials.

    Abstract translation: 本发明提供一种通过金属催化剂作用作为前体使用环硼烷低聚物生长的高品质氮化硼膜的制造方法。 该方法解决了根据现有技术在CVD(化学气相沉积)中发生的气态前体的控制和蒸汽压力控制的问题,并且通过简单的方法以低成本获得高质量的六方氮化硼膜 。 此外,六方氮化硼膜可以涂覆到各种结构和材料上。 此外,允许选择性涂布以在预定区域中进行涂布,并且还允许放大。 因此,该方法可用于复合材料和各种材料的涂覆应用。

    Carbon nanofibers with sharp tip ends and a carbon nanofibers growth method using a palladium catalyst

    公开(公告)号:US09970130B2

    公开(公告)日:2018-05-15

    申请号:US14808683

    申请日:2015-07-24

    CPC classification number: D01F9/127

    Abstract: The present invention relates to a carbon nanofibers growth method including (S1) depositing an alumina layer on a silicon substrate, (S2) depositing palladium on the alumina layer to form a palladium catalyst layer, and (S3) growing carbon nanofibers on the palladium catalyst layer by a chemical vapor deposition (CVD) method, and carbon nanofibers vertically grown on an alumina layer-deposited silicon substrate, the carbon nanofibers having tip ends with a radius of curvature less than or equal to 5 nm, a diameter less than or equal to 50 nm, a length more than or equal to 1 mm, and a length-diameter aspect ratio more than or equal to 50,000.

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