公开(公告)号：US20190079363A1

公开(公告)日：2019-03-14

申请号：US16113336

申请日：2018-08-27

Applicant: LG Display Co., Ltd.

Inventor： Sang-Wook LEE ,  Duk-Keun YOO

IPC: G02F1/1362 ,  H01L27/12 ,  G02F1/1368 ,  G02F1/1334 ,  G02F1/1337

Abstract: An array substrate for a display device includes: a substrate having a plurality of pixel regions; a plurality of gate lines on the substrate, each of the plurality of gate lines including a plurality of gate patterns spaced apart from each other; a plurality of data lines crossing the plurality of gate lines to define the plurality of pixel regions; and a first connecting pattern connecting the plurality of gate patterns, the first connecting pattern having a different layer from the plurality of gate lines.

公开(公告)号：US20160300867A1

公开(公告)日：2016-10-13

申请号：US15180970

申请日：2016-06-13

Applicant: LG Display Co., LTD.

Inventor： Cheol-Se KIM ,  Jae-Hyung JO ,  Duk-Keun YOO

IPC: H01L27/12 ,  H01L29/45 ,  H01L29/786

CPC classification number: H01L27/1288 ,  G02F2001/136231 ,  G02F2001/136236 ,  G02F2001/136295 ,  G02F2202/103 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1255 ,  H01L29/458 ,  H01L29/78669 ,  H01L29/78696

Abstract: A method of fabricating an array substrate for a liquid crystal display device can include forming a gate line and a gate electrode, and a gate insulating layer; forming an active layer on the gate insulating layer and an ohmic contact layer on the active layer; forming a data line and source and drain electrodes; forming a passivation layer on the source and drain electrodes; and forming a pixel electrode on the passivation layer, in which the ohmic contact layer covers an entire top surface of the active layer between the source and drain electrodes; forming a metallic layer on the gate insulating layer and the ohmic contact layer; etching the metallic layer to faun the data line, and the source drain electrodes, in which a silicide layer is formed on the ohmic contact layer only in the space between the source and drain electrodes; and removing the silicide layer.

Abstract translation: 制造液晶显示装置用阵列基板的方法可以包括形成栅极线和栅电极以及栅极绝缘层; 在栅极绝缘层上形成有源层和在有源层上形成欧姆接触层; 形成数据线和源极和漏极; 在源极和漏极上形成钝化层; 以及在所述钝化层上形成像素电极，其中所述欧姆接触层覆盖所述源极和漏极之间的有源层的整个顶表面; 在栅绝缘层和欧姆接触层上形成金属层; 蚀刻金属层以使源极和漏极之间的空间中仅在欧姆接触层上形成硅化物层的数据线和源极漏极; 并除去硅化物层。

公开(公告)号：US20140240632A1

公开(公告)日：2014-08-28

申请号：US14276903

申请日：2014-05-13

Applicant: LG Display Co., Ltd.

Inventor： Cheol-Se KIM ,  Jae-Hyung JO ,  Duk-Keun YOO

IPC: H01L27/12 ,  G02F1/1343

CPC classification number: H01L27/1288 ,  G02F2001/136231 ,  G02F2001/136236 ,  G02F2001/136295 ,  G02F2202/103 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1255 ,  H01L29/458 ,  H01L29/78669 ,  H01L29/78696

Abstract: An array substrate for a liquid crystal display device includes a gate line and a gate electrode on a substrate, the gate electrode connected to the gate line; a gate insulating layer on the gate line and the gate electrode; an active layer of intrinsic amorphous silicon on the gate insulating layer and corresponding to the gate electrode; an ohmic contact layer of impurity-doped amorphous silicon on the active layer; a data line crossing the gate line; a source electrode on the ohmic contact layer and connected to the data line; a drain electrode on the ohmic contact layer and spaced apart from the source electrode; a passivation layer on the source and drain electrodes and including a drain contact hole exposing a portion of the drain electrode; and a pixel electrode on the passivation layer and connected to the drain electrode through the drain contact hole.

Abstract translation: 用于液晶显示装置的阵列基板包括在基板上的栅极线和栅电极，栅电极连接到栅极线; 栅极线上的栅极绝缘层和栅电极; 栅极绝缘层上的对应于栅电极的本征非晶硅的有源层; 有源层上杂质掺杂非晶硅的欧姆接触层; 跨越栅极线的数据线; 欧姆接触层上的源电极并连接到数据线; 欧姆接触层上的漏电极并与源电极间隔开; 在所述源电极和漏电极上的钝化层，并且包括暴露所述漏电极的一部分的漏极接触孔; 以及钝化层上的像素电极，并通过漏极接触孔与漏电极连接。