公开(公告)号：US20200157394A1

公开(公告)日：2020-05-21

申请号：US16611250

申请日：2018-03-02

Applicant: MEC COMPANY LTD.

Inventor： Itsuro TOMATSU ,  Kosuke KUMAZAKI ,  Yasutaka AMITANI ,  Yuko SHIBANUMA ,  Ikuyo KATAYAMA

IPC: C09J179/02 ,  B32B15/08 ,  B32B15/20 ,  B32B37/12 ,  C23C22/06 ,  C23C22/63 ,  C23C22/68 ,  C09J11/04 ,  C09J5/02 ,  H05K3/38

Abstract: The coating film-forming composition includes an aromatic compound having an amino group and an aromatic ring in one molecule, and thio compound (sulfur oxoacids having a pKa of −1.9 or less and salts thereof are excluded). pH of the coating film-forming composition is 4 to 10. The thio compound is preferably one that ionized to form anions in a solution, and thiosulfate and thiocyanate are especially preferable. By bringing the coating film-forming composition into contact with the surface of a metal member, a coating film is formed on the surface of the metal member, so that a surface-treated metal member can be obtained.