公开(公告)号：US20200157394A1

公开(公告)日：2020-05-21

申请号：US16611250

申请日：2018-03-02

Applicant: MEC COMPANY LTD.

Inventor： Itsuro TOMATSU ,  Kosuke KUMAZAKI ,  Yasutaka AMITANI ,  Yuko SHIBANUMA ,  Ikuyo KATAYAMA

IPC: C09J179/02 ,  B32B15/08 ,  B32B15/20 ,  B32B37/12 ,  C23C22/06 ,  C23C22/63 ,  C23C22/68 ,  C09J11/04 ,  C09J5/02 ,  H05K3/38

Abstract: The coating film-forming composition includes an aromatic compound having an amino group and an aromatic ring in one molecule, and thio compound (sulfur oxoacids having a pKa of −1.9 or less and salts thereof are excluded). pH of the coating film-forming composition is 4 to 10. The thio compound is preferably one that ionized to form anions in a solution, and thiosulfate and thiocyanate are especially preferable. By bringing the coating film-forming composition into contact with the surface of a metal member, a coating film is formed on the surface of the metal member, so that a surface-treated metal member can be obtained.

公开(公告)号：US20170342566A1

公开(公告)日：2017-11-30

申请号：US15537963

申请日：2015-09-17

Applicant: MEC COMPANY LTD.

Inventor： Yuko SHIBANUMA ,  Tatsuya GODA ,  Jojiro NIGORO ,  Tomoko ICHIHASHI ,  Keisuke JOKO ,  Takahiro YAMADA ,  Tsuyoshi AMATANI

IPC: C23C18/16 ,  H05K3/18 ,  H05K3/26

CPC classification number: C23C18/1689 ,  C23C18/1834 ,  C23C18/54 ,  H05K3/187 ,  H05K3/24 ,  H05K3/26 ,  H05K2203/072 ,  H05K2203/0789

Abstract: The invention relates to a washing solution for a tin plating film after electroless tin plating and before water washing. The invention also relates to a method for forming a tin plating film, the method includes a step of washing step using the washing solution. The washing solution according to the present invention is an acidic aqueous solution containing an acid, a complexing agent, a stabilizer and a chloride ion. The washing solution has a chloride ion concentration of 2 wt % or more, and a tin concentration of 0.5 wt % or less. The washing solution according to the present invention has good washing property for a tin plating film surface, and allows a tin plating film to easily maintain its properties. In addition the washing solution causes little influence on a tin plating film surface even when continuously used and is excellent in temporal stability.