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公开(公告)号:US11767594B2
公开(公告)日:2023-09-26
申请号:US17251847
申请日:2019-06-24
Applicant: MOLECULAR PLASMA GROUP SA
Inventor: Gill Scheltjens , Régis Heyberger , Malek Alnasser
IPC: C23C16/513 , B05B7/22 , B05B15/18 , B05B7/04 , B05B13/02 , C23C16/455 , H05H1/28 , H05H1/24
CPC classification number: C23C16/513 , B05B7/04 , B05B7/22 , B05B13/0214 , B05B13/0228 , B05B15/18 , C23C16/45563 , H05H1/28 , H05H1/2406 , H05H1/47
Abstract: A method for plasma coating an object includes an object profile, having the steps of: a) manufacturing a replaceable shield comprising a jet inlet, a nozzle outlet and a sidewall extending from the jet inlet to the nozzle outlet, wherein the nozzle outlet includes an edge essentially congruent to at least part of the object profile; b) detachably attaching the replaceable shield to a jet outlet of a plasma jet generator; c) placing the object at the nozzle outlet such that the object profile fits closely to the nozzle outlet edge; d) plasma coating the object with a low-temperature, oxygen-free plasma at an operating pressure which is higher than the atmospheric pressure by providing a plasma jet in the shield via the plasma jet generator and injecting coating precursors in the plasma jet in the shield.
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公开(公告)号:US11845105B2
公开(公告)日:2023-12-19
申请号:US16640103
申请日:2018-08-23
Applicant: MOLECULAR PLASMA GROUP SA
Inventor: Régis Heyberger , Gill Scheltjens
IPC: B05D1/00 , B05D1/34 , C09D133/16 , C09D183/04
CPC classification number: B05D1/62 , B05D1/34 , C09D133/16 , C09D183/04
Abstract: A method for depositing a coating on a substrate is disclosed. A first precursor comprising fluoro-acrylate monomers, fluoro-alkyl acrylate monomers, fluoro-methacrylate monomers, fluoro-alkyl methacrylate monomers, fluoro-silane monomers, or a combination or derivates thereof is provided. A second precursor comprising linear siloxanes, silane monomers, cyclosiloxanes, cyclosilane monomers, or a combination or derivates thereof is provided. The first and second precursors are co-injected in a treatment region. An atmospheric or reduced pressure plasma discharge is created in said treatment region. The substrate coating comprises alternated multi-stacked nanostructures and is formed by copolymerization of the first and second precursors.
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