公开(公告)号：US20240297124A1

公开(公告)日：2024-09-05

申请号：US18593504

申请日：2024-03-01

Applicant: Micron Technology, Inc.

Inventor： Shruthi Kumara Vadivel ,  Harsh Narendrakumar Jain ,  Lance David Williamson ,  Kaveri Jain ,  Adam Lewis Olson

IPC: H01L23/544 ,  H01L21/308

CPC classification number: H01L23/544 ,  H01L21/308 ,  H01L2223/54426

Abstract: A memory device can include a substrate and a first alignment mark embedded in the substrate. The first alignment mark can be configured to a reference for a patterned second masking layer which is different from a first masking layer deposited on the substrate, and onto which the second patterned masking layer is deposited. The first masking layer can be an opaque or semi-opaque sacrificial layer and a second alignment mark can comprise at least a portion of the first masking layer. A location of the second alignment mark can correspond to a particular structure location in the substrate. The patterned second masking layer can include an additional alignment mark that is spaced laterally apart from the second alignment mark and the patterned second masking layer can define one or more locations of one or more structural features in the substrate.

公开(公告)号：US20250006655A1

公开(公告)日：2025-01-02

申请号：US18750247

申请日：2024-06-21

Applicant: Micron Technology, Inc.

Inventor： Shruthi Kumara Vadivel ,  Harsh Narendrakumar Jain ,  Lance David Williamson ,  Kaveri Jain ,  Adam Lewis Olson

IPC: H01L23/544 ,  H01L21/311

Abstract: Aligning pillars of a three-dimensional NAND memory assembly can include forming a first pillar and a corresponding first pillar alignment feature in at least a portion of a first substrate stack. The alignment method can include depositing a second substrate stack on the first substrate stack, covering the first pillar alignment feature and the first pillar, and depositing a first masking layer on at least a portion of the second substrate stack. Illumination light can be used to illuminate a portion of the first masking layer. A reflected portion of the illumination light can indicate a location of the first pillar alignment feature corresponding to the first pillar. Particular wavelengths of the illumination light can be blocked or filtered by the first masking layer.