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公开(公告)号：US20140098380A1
公开(公告)日：2014-04-10
申请号：US14099512
申请日：2013-12-06
CPC分类号： G01N1/28 , G01B11/14 , G01N1/32 , H01J37/185 , H01J37/20 , H01J37/3056 , H01J37/32082 , H01J2237/1825 , H01J2237/3174 , H01J2237/335
摘要： An apparatus for preparing specimens for microscopy including equipment for providing two or more of each of the following specimen processing activities under continuous vacuum conditions: plasma cleaning the specimen, ion beam or reactive ion beam etching the specimen, plasma etching the specimen and coating the specimen with a conductive material. Also, an apparatus and method for detecting a position of a surface of the specimen in a processing chamber, wherein the detected position is used to automatically move the specimen to appropriate locations for subsequent processing.
摘要翻译： 包括用于在连续真空条件下提供以下两种或多种以下样品处理活性的设备的显微镜准备装置：等离子体清洗样品，离子束或反应离子束蚀刻样品，等离子体蚀刻样品并涂覆样品 与导电材料。 另外，一种用于检测处理室中样品表面的位置的装置和方法，其中检测位置用于自动将样本移动到合适的位置进行后续处理。
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公开(公告)号：US20140157914A1
公开(公告)日：2014-06-12
申请号：US14183195
申请日：2014-02-18
IPC分类号： G01N1/28
CPC分类号： G01N1/28 , G01B11/14 , G01N1/32 , H01J37/185 , H01J37/20 , H01J37/3056 , H01J37/32082 , H01J2237/1825 , H01J2237/3174 , H01J2237/335
摘要： An apparatus for preparing specimens for microscopy including equipment for providing two or more of each of the following specimen processing activities under continuous vacuum conditions: plasma cleaning the specimen, ion beam or reactive ion beam etching the specimen, plasma etching the specimen and coating the specimen with a conductive material. Also, an apparatus and method for detecting a position of a surface of the specimen in a processing chamber, wherein the detected position is used to automatically move the specimen to appropriate locations for subsequent processing.
摘要翻译： 包括用于在连续真空条件下提供以下两种或多种以下样品处理活性的设备的显微镜准备装置：等离子体清洗样品，离子束或反应离子束蚀刻样品，等离子体蚀刻样品并涂覆样品 与导电材料。 另外，一种用于检测处理室中样品表面的位置的装置和方法，其中检测位置用于自动将样本移动到合适的位置进行后续处理。
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