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公开(公告)号：US20240183805A1
公开(公告)日：2024-06-06
申请号：US18061908
申请日：2022-12-05
Applicant: The Aerospace Corporation
Inventor： Rafael J. ZALDIVAR , Hyun I. KIM , Geena L. FERRELLI
IPC: G01N23/2251 , G01N1/32 , G01N33/44 , G01Q60/24
CPC classification number: G01N23/2251 , G01N1/32 , G01N33/442 , G01Q60/24 , G01N2223/07 , G01N2223/418 , G01N2223/507
Abstract: Evaluating the quality of cyanate ester matrix resin material includes inserting a small piece of a deposit extracted from a composite laminate into an epoxy for cross-sectional analysis, and performing cross-sectional polishing on the small piece of the deposit. Evaluating the quality of the cyanate ester matrix resin material also includes performing resolution imaging to study a plurality of plies in the small piece of the deposit to evaluate each ply without causing destruction to each of the plurality of plies.
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公开(公告)号：US11860082B1
公开(公告)日：2024-01-02
申请号：US16515817
申请日：2019-07-18
Applicant: Massachusetts Materials Technologies LLC
Inventor： Simon C. Bellemare , Steven D. Palkovic , Brendon M. Willey , Soheil Safari Loaliyan , Parth P. Patel
CPC classification number: G01N19/08 , G01B11/02 , G01N1/32 , G01N3/42 , G01N3/46 , G01N33/207 , G01N2203/0082
Abstract: A method for evaluating a weld in a formed object includes performing a contact mechanics test of a first region that includes the weld and storing one or more corresponding weld surface mechanical property measurements, performing a contact mechanics test of a second region that excludes the weld and storing one or more corresponding base material surface mechanical property measurements, determining a relative difference in the weld surface mechanical property measurements and the base material surface mechanical property measurements, determining one or more weld width measurements on the exterior surface of the formed object, and evaluating the weld based on the determined relative difference in the weld surface mechanical property measurements and the base material surface mechanical property measurements in relation to the determined weld width measurements in order to provide an index of weld quality that is traditionally measured through a destructive test or examination.
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3.发明公开公开(公告)号：US20230420216A1
公开(公告)日：2023-12-28
申请号：US17748902
申请日：2022-05-19
Applicant: FEI Company
Inventor： Krishna Kanth NEELISETTY , Petr WANDROL , Ondrej KLVAC , Yakub FAM , Libor NOVAK , Michal HROUZEK
IPC: H01J37/305 , H01J37/20 , G01N1/32 , G01N1/28
CPC classification number: H01J37/3056 , G01N1/286 , G01N1/32 , H01J37/20
Abstract: Systems and methods for operating a combined laser and broad ion beam (BIB) polisher in a sample preparation workflow, are disclosed. An example method for operating a combined laser and broad ion beam (BIB) polisher according to the present invention comprises positioning a sample within the interior volume of the combined BIB and laser sample preparation system, causing a laser source component of the combined BIB and laser sample preparation system to emit an optical beam towards the sample, and causing a BIB source component of the combined BIB and laser sample preparation system to emit a broad ion beam towards the sample. The optical beam and the broad ion beam are each configured to cause a first portion and a second portion of the sample upon which it is incident to be removed, respectively.
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4.发明申请公开(公告)号：US20190204199A1
公开(公告)日：2019-07-04
申请号：US16232282
申请日：2018-12-26
Applicant: Central Iron and Steel Research Institute
Inventor： Dongling LI , Xuejing SHEN , Lei ZHAO , Haizhou WANG , Weihao WAN , Bing HAN , Yuhua LU , Feifei FENG , Chao LI
CPC classification number: G01N15/0227 , C25F3/22 , G01N1/32 , G06K9/0014 , G06T3/0068 , G06T7/174 , G06T7/70 , G06T2207/10056 , G06T2207/10148 , G06T2207/20152 , G06T2207/20221 , G06T2207/30136
Abstract: The invention belongs to the technical field of the quantitative statistical distribution analysis of the features from characteristic images of microstructures and precipitated phases in metal materials, and relates to a quantitative statistical distribution characterization method of precipitate particles with the full field of view in a metal material. The method comprises the following steps of electrolytic corrosion of a metallic material specimen, automatic collection of characteristic images of microstructure, automatic stitching and fusion of the full-view-field microstructure images, automatic identification and segmentation of the precipitate particles and quantitative distribution characterization of the precipitate particles with the full field of view in a large-range scale. By establishing a mathematic model, the large-range automatic stitching and fusion of the characteristic images of the full-view-field microstructures in a characteristic region and the automatic segmentation and identification of the precipitate particles are realized; and the quantitative statistical distribution characterization information of the full-view-field morphology, quantity, size, distribution and the like of plentiful precipitated phases in a larger range is quickly obtained. The method has the features of being accurate, high-efficiency and informative in quantitative distribution characterization, as well as has much more statistical representativeness compared with conventional single-view-field quantitative image analysis.
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公开(公告)号：US10008426B2
公开(公告)日：2018-06-26
申请号：US15254310
申请日：2016-09-01
Applicant: TOSHIBA MEMORY CORPORATION
Inventor： Takehiro Nakai , Norihiko Tsuchiya , Sakae Funo , Junichi Shimada , Youko Itabashi
IPC: H01L21/66 , H01L21/306 , H01L21/02 , C09K13/08 , H01L21/30
CPC classification number: H01L22/24 , C09K13/08 , G01N1/32 , H01L21/02238 , H01L21/30604
Abstract: An etching method for detecting crystal defects, the method includes providing a substrate with an etchant containing hydrogen fluoride, nitric acid, hydrogen chloride, and water. A concave portion on a part having a crystal defect of the substrate is formed by the etchant. The concave portion is examined by a microscope to locate a position of the crystal defect.
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Patent Agency Ranking
公开(公告)号：US20180174798A1
公开(公告)日：2018-06-21
申请号：US15897954
申请日：2018-02-15
Applicant: Dimitry BOGUSLAVSKY , Mark KOVLER
Inventor： Dimitry BOGUSLAVSKY , Mark KOVLER
IPC: H01J37/305 , G01N1/32 , H01J37/147 , H01J37/20
CPC classification number: H01J37/3056 , G01N1/286 , G01N1/32 , G01N2001/2873 , H01J37/147 , H01J37/20 , H01J2237/0827 , H01J2237/1505 , H01J2237/31745 , H01J2237/31749
Abstract: Methods, apparatuses, systems and software for ion beam milling or machining are disclosed. The apparatus includes a specimen holder, a table, one or more ion sources, rotatable ion optics, and an imaging device. The specimen holder is configured to hold a specimen in a stationary position during milling or machining. The table is configured to change the stationary position of the specimen holder in any of three orthogonal linear directions and an angular direction. The rotatable ion optics are configured to emit an ion beam towards a predetermined location on the specimen from any of the one or more ion sources at any angle around an axis that is orthogonal to a horizontal surface of the table when the angular direction of the table is 0°. The imaging device is configured to generate an image of the specimen including the predetermined location, thereby enabling real-time monitoring of the milling or machining process.
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公开(公告)号：US09978586B2
公开(公告)日：2018-05-22
申请号：US15087968
申请日：2016-03-31
Applicant: FEI Company
Inventor： Brian Roberts Routh, Jr. , Thomas G. Miller , Chad Rue , Noel Thomas Franco
CPC classification number: H01L21/02266 , C23C14/221 , C23C14/30 , G01N1/32 , H01J37/3056 , H01J2237/3174 , H01J2237/31744 , H01J2237/31745 , H01J2237/31749 , H01L21/02164 , H01L21/02214 , H01L21/02362
Abstract: A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.
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公开(公告)号：US09911573B2
公开(公告)日：2018-03-06
申请号：US14642138
申请日：2015-03-09
Applicant: Dimitry Boguslavsky , Mark Kovler
Inventor： Dimitry Boguslavsky , Mark Kovler
IPC: C23C16/50 , H01J37/305 , G01N1/32 , H01J37/147 , H01J37/20
CPC classification number: H01J37/3056 , G01N1/32 , H01J37/147 , H01J37/20 , H01J2237/0245 , H01J2237/0827 , H01J2237/1505 , H01J2237/31745 , H01J2237/31749
Abstract: Methods, apparatuses, systems and software for ion beam milling or machining are disclosed. The apparatus includes a specimen holder, a table, one or more ion sources, rotatable ion optics, and an imaging device. The specimen holder is configured to hold a specimen in a stationary position during milling or machining. The table is configured to change the stationary position of the specimen holder in any of three orthogonal linear directions and an angular direction. The rotatable ion optics are configured to emit an ion beam towards a predetermined location on the specimen from any of the one or more ion sources at any angle around an axis that is orthogonal to a horizontal surface of the table when the angular direction of the table is 0°. The imaging device is configured to generate an image of the specimen including the predetermined location, thereby enabling real-time monitoring of the milling or machining process.
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9.发明申请公开(公告)号：US20170269004A1
公开(公告)日：2017-09-21
申请号：US15074091
申请日：2016-03-18
Applicant: Hemlock Semiconductor Corporation
Inventor： Adam Fournier , Douglas Kreszowski , Carl Puehl, III
CPC classification number: G01N21/94 , G01N1/32 , G01N21/73 , G01N27/626 , G01N30/8675 , G01N33/20 , G01N2033/0095 , H01L21/30604
Abstract: A method of quantifying metal impurities on a silicon product, includes obtaining a sample of the silicon product; etching or chemically treating a surface of silicon product to retrieve a predetermined amount of silicon product mass; and testing and measuring the etched portion for the presence of metal impurities using a testing measurement technique selected from ICP-MS, ICP-OES, IC, or a combination comprising at least one for the foregoing, wherein the metal impurities are selected from sodium, magnesium, nickel, copper, zinc, molybdenum, tungsten, aluminum, potassium, calcium, titanium, chromium, manganese, iron, cobalt, or a combination comprising at least one of the foregoing.
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公开(公告)号：US09761412B2
公开(公告)日：2017-09-12
申请号：US15306510
申请日：2014-05-09
Applicant: Hitachi High-Technologies Corporation
Inventor： Kento Horinouchi , Atsushi Kamino , Toru Iwaya , Hisayuki Takasu
IPC: H01J37/305 , H01J37/30 , G01N1/32 , H01J37/20 , H01J37/09
CPC classification number: H01J37/305 , G01N1/32 , H01J37/09 , H01J37/20 , H01J37/3053 , H01J2237/045 , H01J2237/3151
Abstract: Provided is a technology for suppressing a heat rise in a sample, the heat rise being generated due to ion beam irradiation at a low acceleration voltage. A blocking plate, which is different from a mask, is disposed in front of a sample. The blocking plate has an opening that overlaps a processing surface, and ion beams pass only through the opening of the blocking plate, and in the areas excluding the opening, the ion beams are blocked by the blocking plate, and the sample is not irradiated thereby. Furthermore, the heat rise in the sample is further suppressed by cooling the blocking plate.
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