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公开(公告)号:US10037925B2
公开(公告)日:2018-07-31
申请号:US15357465
申请日:2016-11-21
申请人: Qorvo US, Inc.
IPC分类号: H01L21/66 , H01L23/00 , H01L23/544 , H01L21/78
CPC分类号: H01L22/14 , H01L21/78 , H01L22/20 , H01L22/32 , H01L23/544 , H01L24/09 , H01L24/17 , H01L24/81 , H01L2224/17104 , H01L2224/175 , H01L2224/81001 , H01L2224/81052 , H01L2924/01013 , H01L2924/01029 , H01L2924/01079
摘要: Methods of fabricating semiconductor devices and Radio Frequency (RF) components are provided. The method includes providing a circuit layout on a semiconductor layer and providing one or more sacrificial connections to connect bump pads in the circuit layout. The method also includes testing the circuit layout using the one or more sacrificial connections and removing at least a portion of the one or more sacrificial connections. In this way, the performance of the semiconductor device is improved by reducing or avoiding capacitive or inductive leakage paths that can be caused by leftover materials.
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公开(公告)号:US10217677B2
公开(公告)日:2019-02-26
申请号:US15953581
申请日:2018-04-16
申请人: Qorvo US, Inc.
摘要: Methods of fabricating semiconductor devices and Radio Frequency (RF) components are provided. The method includes providing a circuit layout on a semiconductor layer and providing one or more sacrificial connections to connect bump pads in the circuit layout. The method also includes testing the circuit layout using the one or more sacrificial connections and removing at least a portion of the one or more sacrificial connections. In this way, the performance of the semiconductor device is improved by reducing or avoiding capacitive or inductive leakage paths that can be caused by leftover materials.
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公开(公告)号:US20180240719A1
公开(公告)日:2018-08-23
申请号:US15953581
申请日:2018-04-16
申请人: Qorvo US, Inc.
IPC分类号: H01L21/66 , H01L21/78 , H01L23/00 , H01L23/544
CPC分类号: H01L22/14 , H01L21/78 , H01L22/20 , H01L22/32 , H01L23/544 , H01L24/09 , H01L24/17 , H01L24/81 , H01L2224/17104 , H01L2224/175 , H01L2224/81001 , H01L2224/81052 , H01L2924/01013 , H01L2924/01029 , H01L2924/01079
摘要: Methods of fabricating semiconductor devices and Radio Frequency (RF) components are provided. The method includes providing a circuit layout on a semiconductor layer and providing one or more sacrificial connections to connect bump pads in the circuit layout. The method also includes testing the circuit layout using the one or more sacrificial connections and removing at least a portion of the one or more sacrificial connections. In this way, the performance of the semiconductor device is improved by reducing or avoiding capacitive or inductive leakage paths that can be caused by leftover materials.
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公开(公告)号:US20170256467A1
公开(公告)日:2017-09-07
申请号:US15357465
申请日:2016-11-21
申请人: Qorvo US, Inc.
IPC分类号: H01L21/66 , H01L23/544 , H01L21/78 , H01L23/00
CPC分类号: H01L22/14 , H01L21/78 , H01L22/20 , H01L22/32 , H01L23/544 , H01L24/09 , H01L24/17 , H01L24/81 , H01L2224/17104 , H01L2224/175 , H01L2224/81001 , H01L2224/81052 , H01L2924/01013 , H01L2924/01029 , H01L2924/01079
摘要: Methods of fabricating semiconductor devices and Radio Frequency (RF) components are provided. The method includes providing a circuit layout on a semiconductor layer and providing one or more sacrificial connections to connect bump pads in the circuit layout. The method also includes testing the circuit layout using the one or more sacrificial connections and removing at least a portion of the one or more sacrificial connections. In this way, the performance of the semiconductor device is improved by reducing or avoiding capacitive or inductive leakage paths that can be caused by leftover materials.
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