THIN LAYER DEPOSITION PROCESS
    2.
    发明申请

    公开(公告)号:US20190337840A1

    公开(公告)日:2019-11-07

    申请号:US16302006

    申请日:2017-05-22

    Abstract: A process for obtaining a material includes a substrate coated with a photocatalytic coating, the process including depositing on the substrate, by sputtering, a stack of thin layers successively including a first layer of titanium metal having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of titanium metal having a thickness of from 2 to 5 nm; and oxidizing the stack, with the aid of a heat treatment by laser radiation, wherein the stack is in contact with an oxidizing atmosphere.

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