公开(公告)号：US09915623B2

公开(公告)日：2018-03-13

申请号：US15218584

申请日：2016-07-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kwang Soo Kim ,  Taejoong Kim ,  Byeonghwan Jeon ,  Yongsuk Choi ,  Youngduk Kim ,  Taeseok Oh ,  SangYun Lee ,  Yong-Ho Choi

IPC: G01N21/00 ,  G01N21/95 ,  G02B27/09 ,  G02B13/00 ,  G02B3/00 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/95623 ,  G02B3/0006 ,  G02B13/0095 ,  G02B27/0988

Abstract: An optical inspection apparatus includes an inspection target unit on which an inspection target is loaded, an illumination optical unit configured to irradiate incident light to the inspection target, an objective lens unit disposed between the illumination optical unit and the inspection target unit, a detection optical unit configured to receive reflective light reflected from the inspection target to thereby detect a presence or absence of a defect on the inspection target, and a control unit configured to control the illumination optical unit and the detection optical unit. The illumination optical unit includes a light source part configured to irradiate the incident light, and a spatial filter array configured to modify a transmission region of the incident light irradiated from the light source part. The spatial filter array includes a spatial filter part, and a filter movement part configured to move the spatial filter part.

公开(公告)号：US10732129B2

公开(公告)日：2020-08-04

申请号：US16250378

申请日：2019-01-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwang Soo Kim ,  Youngkyu Park ,  Sungho Jang ,  Byeonghwan Jeon

IPC: G01N21/956 ,  G03F7/20

Abstract: Disclosed are an apparatus for and a method of performing an inspection and metrology process. The apparatus may include a stage configured to load a substrate thereon, a sensor on the stage, an object lens between the sensor and the stage, a light source generating an illumination light to be transmitted to the substrate through the object lens, a first band filtering part between the light source and the object lens to control a wavelength of the illumination light within a first bandwidth, and a second band filtering part between the light source and the object lens to control a wavelength of the illumination light within a second bandwidth, which is smaller than the first bandwidth.

公开(公告)号：US20170116727A1

公开(公告)日：2017-04-27

申请号：US15247537

申请日：2016-08-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwang Soo KIM ,  Sangbong Park ,  Byeonghwan Jeon ,  Youngduk Kim

IPC: G06T7/00 ,  G02B13/00 ,  G02B27/14 ,  H01L21/66 ,  G01N21/95 ,  G01N21/956 ,  H01L21/67 ,  G02B27/09 ,  H04N5/247

CPC classification number: G06T7/0008 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2201/061 ,  G02B13/0095 ,  G02B27/0988 ,  G02B27/14 ,  G06T7/001 ,  G06T2207/20224 ,  G06T2207/30148 ,  H01L21/67276 ,  H01L22/12 ,  H04N5/247

Abstract: An inspection apparatus includes a light source device providing incident light to a substrate, an objective lens receiving reflection light reflected from the substrate, a light splitting device disposed over the objective lens, first and second optical sensors disposed at both sides of the light splitting device, respectively, and first and second spatial filters disposed between the first optical sensor and the substrate and between the second optical sensor and the substrate, respectively. The first and second spatial filters transmit the reflection light in different forms from each other.

公开(公告)号：US10474133B2

公开(公告)日：2019-11-12

申请号：US15724758

申请日：2017-10-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Janghee Lee ,  Yoo Jin Jeong ,  Sangbong Park ,  Byeonghwan Jeon

IPC: G05B19/4097 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  H01L21/67

Abstract: An inspection device includes a first processor, a second processor, and a server. The first processor detects first coordinates of first feature points from first images in a first image set. The second processor detects second coordinates of second feature points from second images in a second image set. The server generates reference coordinates based on the first coordinates and the second coordinates. The reference coordinates are transmitted to the first processor and the second processor. The first and second image sets correspond to scanned swaths on a wafer.

公开(公告)号：US20170082552A1

公开(公告)日：2017-03-23

申请号：US15218584

申请日：2016-07-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kwang Soo Kim ,  Taejoong Kim ,  Byeonghwan Jeon ,  Yongsuk Choi ,  Youngduk Kim ,  Taeseok Oh ,  SangYun Lee ,  Yong-Ho Choi

IPC: G01N21/88 ,  G01N21/95 ,  G02B3/00 ,  G02B27/09 ,  G02B13/00

CPC classification number: G01N21/9501 ,  G01N21/95623 ,  G02B3/0006 ,  G02B13/0095 ,  G02B27/0988

Abstract: An optical inspection apparatus includes an inspection target unit on which an inspection target is loaded, an illumination optical unit configured to irradiate incident light to the inspection target, an objective lens unit disposed between the illumination optical unit and the inspection target unit, a detection optical unit configured to receive reflective light reflected from the inspection target to thereby detect a presence or absence of a defect on the inspection target, and a control unit configured to control the illumination optical unit and the detection optical unit. The illumination optical unit includes a light source part configured to irradiate the incident light, and a spatial filter array configured to modify a transmission region of the incident light irradiated from the light source part. The spatial filter array includes a spatial filter part, and a filter movement part configured to move the spatial filter part.