公开(公告)号：US20240417301A1

公开(公告)日：2024-12-19

申请号：US18815333

申请日：2024-08-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jongha YUN ,  Seyoon KIM ,  Juhui PARK ,  Jiyeon LEE ,  Cheolmin SHIN

IPC: C02F9/00 ,  B01D15/36 ,  B01D61/02 ,  B01D61/08 ,  B01D61/14 ,  B01D63/02 ,  B08B3/02 ,  B08B3/14 ,  B08B13/00 ,  C02F1/28 ,  C02F1/42 ,  C02F1/44 ,  C02F103/04 ,  C02F103/34 ,  H01L21/67

Abstract: Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.