公开(公告)号：US20240417301A1

公开(公告)日：2024-12-19

申请号：US18815333

申请日：2024-08-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jongha YUN ,  Seyoon KIM ,  Juhui PARK ,  Jiyeon LEE ,  Cheolmin SHIN

IPC: C02F9/00 ,  B01D15/36 ,  B01D61/02 ,  B01D61/08 ,  B01D61/14 ,  B01D63/02 ,  B08B3/02 ,  B08B3/14 ,  B08B13/00 ,  C02F1/28 ,  C02F1/42 ,  C02F1/44 ,  C02F103/04 ,  C02F103/34 ,  H01L21/67

Abstract: Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.

公开(公告)号：US20240317622A1

公开(公告)日：2024-09-26

申请号：US18475898

申请日：2023-09-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Juhui PARK ,  Jongha YUN ,  Younhaeng LEE

IPC: C02F9/00 ,  H01L21/02 ,  H01L21/306

CPC classification number: C02F9/00 ,  H01L21/02041 ,  H01L21/30604 ,  H01L21/30625 ,  C02F1/20 ,  C02F1/283 ,  C02F1/325 ,  C02F1/42 ,  C02F2001/422 ,  C02F2101/10 ,  C02F2101/30 ,  C02F2103/04 ,  C02F2103/346 ,  C02F2201/326 ,  C02F2209/20 ,  C02F2209/22

Abstract: Disclosed are ultrapure water production systems, semiconductor processing systems, and semiconductor fabrication methods. An ultrapure water production system may include a front filtering part that filters a fluid and a rear filtering part that filters the fluid released from the front filtering part. The rear filtering part may include a UV irradiator that irradiates a UV ray to the fluid to remove an organic material from the fluid, an ANP that removes hydrogen peroxide from the fluid released from the UV irradiator, a connection line that connects the UV irradiator to the ANP, a hydrogen peroxide detector that is on the connection line and detects a concentration of hydrogen peroxide in the fluid released from the UV irradiator, and a DO detector between the hydrogen peroxide detector and the ANP to measure a concentration of dissolved oxygen in the fluid released from the UV irradiator.

公开(公告)号：US20230302502A1

公开(公告)日：2023-09-28

申请号：US18094820

申请日：2023-01-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jongha YUN ,  Seyoon KIM ,  Juhui PARK ,  Jiyeon LEE ,  Cheolmin Shin

IPC: B08B3/14 ,  C02F1/28 ,  C02F1/44 ,  C02F1/42 ,  B01D61/08 ,  B01D61/02 ,  B01D63/02 ,  B01D15/36 ,  B08B3/02 ,  B08B13/00 ,  H01L21/67

CPC classification number: B08B3/14 ,  C02F1/283 ,  C02F1/441 ,  C02F1/42 ,  B01D61/08 ,  B01D61/02 ,  B01D63/02 ,  B01D15/361 ,  B08B3/022 ,  B08B13/00 ,  H01L21/67017 ,  C02F2209/40 ,  C02F2201/005 ,  C02F2103/04

Abstract: Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.