Abstract:
A method of fabricating a semiconductor device includes forming an active region in a semiconductor substrate, forming a plurality of dummy gates on the active region, the plurality of dummy gates having a gate mask disposed thereon, forming an interlayer insulating layer on the gate mask, and performing a one-time chemical mechanical polishing (CMP) process by using a slurry composition capable of polishing the interlayer insulating layer and the gate mask until top surfaces of the dummy gates are exposed.
Abstract:
Disclosed is a display panel of a display apparatus including the display panel and a backlight unit disposed under the display panel, the display panel including: an upper substrate; a lower substrate disposed to face the upper substrate in a traveling direction of light radiated from the backlight unit; a liquid crystal layer disposed between the upper substrate and the lower substrate; a polarizing layer disposed at least below the upper substrate and configured to transmit light polarized in a preset direction of the radiated light to the upper substrate; and an antireflection layer formed on a light exiting surface of the upper substrate through which the radiated light exits and configured to substantially prevent reflection of external light from an external environment thereon.
Abstract:
A smart toothbrush is provided. The smart toothbrush includes a toothbrush head configured to be provided with bristles, a toothbrush body configured to be connected to the toothbrush head and to be able to be held, a temperature sensor configured to measure a temperature within an oral cavity of a user while the user is brushing teeth using the smart toothbrush, and a processor configured to determine a tooth brushing section in which the user is brushing teeth within the oral cavity, based on a temperature value measured by the temperature sensor.
Abstract:
An organic electrolyte for magnesium batteries including an ether solvent; a magnesium compound represented by Formula 1 dissolved in the ether solvent; and a Lewis acid: wherein CY1 is an optionally substituted C6-C50 aromatic ring, X1 is, each independently, an electron withdrawing group, X2 is a halogen, n is an integer of 1 to 10, and an angle between a CY1-X1 bond and a CY1-Mg bond is 150 degrees or less.