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1.发明授权Electrostatic chuck and apparatus for processing a substrate including the same 有权静电吸盘和用于处理包含该衬底的衬底的设备公开(公告)号：US09583371B2
公开(公告)日：2017-02-28
申请号：US14108684
申请日：2013-12-17
发明人： Jea-Eun Jess Shim , Jin-Man Kim , Hee-Sam Kim , Jong-Bum Park , Kwang-Bo Sim , Sang-Young Lee
IPC分类号： C23C16/50 , C23C16/00 , C23F1/00 , H01L21/306 , H01L21/683 , H01J37/32
CPC分类号： H01L21/6833 , H01J37/32009 , H01J37/32091 , H01J37/3244 , H01J37/32697 , H01J37/32724
摘要： An ESC may include a dielectric layer, an electrode, a pedestal, a heater, an adhesive and a protecting ring. The dielectric layer may be configured to support a substrate. The electrode may be disposed in the dielectric layer and is configured to form plasma over the substrate. The pedestal may be disposed under the dielectric layer. The heater may be disposed between the pedestal and the dielectric layer and is configured to heat the substrate. The adhesive may be disposed between the pedestal and the heater, and between the heater and the dielectric layer. The protecting ring may be configured to surround the adhesive. The protecting ring may include a plasma-resistant material.
摘要翻译： ESC可以包括电介质层，电极，基座，加热器，粘合剂和保护环。 介电层可以被配置为支撑衬底。 电极可以设置在电介质层中并且被配置为在衬底上形成等离子体。 基座可以设置在介电层下方。 加热器可以设置在基座和电介质层之间，并且被配置为加热基底。 粘合剂可以设置在基座和加热器之间，以及加热器和电介质层之间。 保护环可以被配置为围绕粘合剂。 保护环可以包括耐等离子体材料。
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2.发明申请ELECTROSTATIC CHUCK AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME 有权用于处理包括其的基材的静电切割机和装置公开(公告)号：US20150170951A1
公开(公告)日：2015-06-18
申请号：US14108684
申请日：2013-12-17
发明人： Jea-Eun Jess Shim , Jin-Man Kim , Hee-Sam Kim , Jong-Bum Park , Kwang-Bo Sim , Sang-Young Lee
IPC分类号： H01L21/683 , H01J37/32
CPC分类号： H01L21/6833 , H01J37/32009 , H01J37/32091 , H01J37/3244 , H01J37/32697 , H01J37/32724
摘要： An ESC may include a dielectric layer, an electrode, a pedestal, a heater, an adhesive and a protecting ring. The dielectric layer may be configured to support a substrate. The electrode may be disposed in the dielectric layer and is configured to form plasma over the substrate. The pedestal may be disposed under the dielectric layer. The heater may be disposed between the pedestal and the dielectric layer and is configured to heat the substrate. The adhesive may be disposed between the pedestal and the heater, and between the heater and the dielectric layer. The protecting ring may be configured to surround the adhesive. The protecting ring may include a plasma-resistant material.
摘要翻译： ESC可以包括电介质层，电极，基座，加热器，粘合剂和保护环。 介电层可以被配置为支撑衬底。 电极可以设置在电介质层中并且被配置为在衬底上形成等离子体。 基座可以设置在介电层下方。 加热器可以设置在基座和电介质层之间，并且被配置为加热基底。 粘合剂可以设置在基座和加热器之间，以及加热器和电介质层之间。 保护环可以被配置为围绕粘合剂。 保护环可以包括耐等离子体材料。
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