公开(公告)号：US20170115572A1

公开(公告)日：2017-04-27

申请号：US15264654

申请日：2016-09-14

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Seulgi JEONG ,  Minsoo KIM ,  Sunghwan KIM ,  Hyunji SONG ,  Sunhae KANG ,  Youngmin KIM ,  Yoona KIM ,  Jinhyung KIM ,  Younhee NAM ,  Jaeyeol BAEK ,  Byeri YOON ,  Chungheon LEE ,  Seunghee HONG ,  Sunmin HWANG

IPC: G03F7/11 ,  G03F7/09 ,  G03F7/40 ,  G03F7/20 ,  G03F7/32

Abstract: A method of producing a layer structure and a method of forming a pattern, the method of producing a layer structure including coating a first composition on a substrate that has a pattern thereon; curing the coated first composition to form a first organic layer; applying a liquid material to the first organic layer to remove a part of the first organic layer; and coating a second composition on remaining parts of the first organic layer; and curing the coated second composition on the remaining parts of the first organic layer to form a second organic layer: wherein the first composition and the second composition each independently include a solvent, and a polymer including a structural unit represented by Chemical Formula 1, *A1-B1*.  [Chemical Formula 1]

公开(公告)号：US20230120368A1

公开(公告)日：2023-04-20

申请号：US17902167

申请日：2022-09-02

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Yoona KIM ,  Hyejeong KIM ,  Sunyoung YANG

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/40

Abstract: A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition includes a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent,

公开(公告)号：US20230101786A1

公开(公告)日：2023-03-30

申请号：US17893458

申请日：2022-08-23

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Hyejeong KIM ,  Soohee KIM ,  Yoona KIM ,  Hyungseok PARK ,  Huichan YUN ,  Jaechul LEE ,  Jonghwa LEE ,  Seulgi JEONG ,  Yunju CHAE ,  Won Jong HWANG

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/40

Abstract: Provided are a hardmask composition including a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, wherein the definitions of Chemical Formula 1 and Chemical Formula 2 are as described in the specification.