公开(公告)号：US20170115572A1

公开(公告)日：2017-04-27

申请号：US15264654

申请日：2016-09-14

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Seulgi JEONG ,  Minsoo KIM ,  Sunghwan KIM ,  Hyunji SONG ,  Sunhae KANG ,  Youngmin KIM ,  Yoona KIM ,  Jinhyung KIM ,  Younhee NAM ,  Jaeyeol BAEK ,  Byeri YOON ,  Chungheon LEE ,  Seunghee HONG ,  Sunmin HWANG

IPC: G03F7/11 ,  G03F7/09 ,  G03F7/40 ,  G03F7/20 ,  G03F7/32

Abstract: A method of producing a layer structure and a method of forming a pattern, the method of producing a layer structure including coating a first composition on a substrate that has a pattern thereon; curing the coated first composition to form a first organic layer; applying a liquid material to the first organic layer to remove a part of the first organic layer; and coating a second composition on remaining parts of the first organic layer; and curing the coated second composition on the remaining parts of the first organic layer to form a second organic layer: wherein the first composition and the second composition each independently include a solvent, and a polymer including a structural unit represented by Chemical Formula 1, *A1-B1*.  [Chemical Formula 1]

公开(公告)号：US20230101786A1

公开(公告)日：2023-03-30

申请号：US17893458

申请日：2022-08-23

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Hyejeong KIM ,  Soohee KIM ,  Yoona KIM ,  Hyungseok PARK ,  Huichan YUN ,  Jaechul LEE ,  Jonghwa LEE ,  Seulgi JEONG ,  Yunju CHAE ,  Won Jong HWANG

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/40

Abstract: Provided are a hardmask composition including a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, wherein the definitions of Chemical Formula 1 and Chemical Formula 2 are as described in the specification.

公开(公告)号：US20160145379A1

公开(公告)日：2016-05-26

申请号：US14886121

申请日：2015-10-19

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Youn-Hee NAM ,  Hyo-Young KWON ,  Sung-Hwan KIM ,  Seung-Hyun KIM ,  Ran NAMGUNG ,  Dominea RATHWELL ,  Soo-Hyoun MUN ,  Seulgi JEONG ,  Hyeon-Il JUNG ,  Yu-Mi HEO

IPC: C08G61/10 ,  C08L65/02 ,  C07C43/23

CPC classification number: C07C43/23 ,  C07C2603/50 ,  C07C2603/52 ,  C08G61/02 ,  C08G2261/1422 ,  C08G2261/1424 ,  C08G2261/312 ,  C08G2261/314 ,  C08G2261/3424 ,  C08G2261/362 ,  C08G2261/45 ,  C08G2261/72 ,  C09D165/00

Abstract: A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1:

Abstract translation: 单体，聚合物，有机层组合物，有机层和相关方法，单体由化学式1表示：

公开(公告)号：US20160126088A1

公开(公告)日：2016-05-05

申请号：US14740456

申请日：2015-06-16

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Min-Soo KIM ,  Hyun-Ji SONG ,  Sun-Hae KANG ,  Sung-Min KIM ,  Sung-Hwan KIM ,  Young-Min KIM ,  Yun-Jun KIM ,  Hea-Jung KIM ,  Youn-Hee NAM ,  Jae-Yeol BAEK ,  Byeri YOON ,  Yong-Woon YOON ,  Chung-Heon LEE ,  Seulgi JEONG ,  Yeon-Hee JO ,  Seung-Hee HONG ,  Sun-Min HWANG ,  Won-Jong HWANG ,  Songse YI ,  MyeongKoo KIM ,  Naery YU

IPC: H01L21/027 ,  H01L21/311

CPC classification number: H01L21/02118 ,  C08G10/00 ,  C08G12/00 ,  C08G61/02 ,  C08G61/12 ,  C08G61/122 ,  C08G61/124 ,  C08G73/0672 ,  C08G2261/124 ,  C08G2261/135 ,  C08G2261/1422 ,  C08G2261/314 ,  C08G2261/3142 ,  C08G2261/3221 ,  C08G2261/3241 ,  C08G2261/3424 ,  C08G2261/344 ,  C08G2261/76 ,  C08G2261/90 ,  G03F7/40 ,  H01L21/02282 ,  H01L21/0332 ,  H01L21/31058 ,  H01L21/31133

Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.

Abstract translation: 制造层结构体的方法包括通过在具有多个图案的基板上涂布含有有机化合物的第一组合物来形成第一有机层，在第一有机层上涂布溶剂以除去第一有机层的一部分，以及 在第一有机层的剩余部分上施加包含有机化合物的第二组合物，并通过固化工艺形成第二有机层。

公开(公告)号：US20250028236A1

公开(公告)日：2025-01-23

申请号：US18678090

申请日：2024-05-30

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Younhee NAM ,  Yushin PARK ,  Seunghyun KIM ,  Seulgi JEONG ,  Sangchol PARK ,  Minji SO ,  Jooyoung CHUNG

IPC: G03F1/50

Abstract: A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming a pattern or patterns using the hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent,

公开(公告)号：US20170176861A1

公开(公告)日：2017-06-22

申请号：US15355088

申请日：2016-11-18

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Younhee NAM ,  Sunghwan KIM ,  Minsoo KIM ,  Youjung PARK ,  Seulgi JEONG

IPC: G03F7/11 ,  C08G61/12 ,  H01L21/308 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  C08G61/10 ,  C09D165/00

CPC classification number: G03F7/11 ,  C08G8/04 ,  C08G8/24 ,  C08G61/02 ,  C08G61/10 ,  C08G61/12 ,  C08G61/124 ,  C08G2261/1422 ,  C08G2261/312 ,  C08G2261/314 ,  C08G2261/3142 ,  C08G2261/3241 ,  C08G2261/3326 ,  C08G2261/3424 ,  C08G2261/344 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/094 ,  G03F7/162 ,  G03F7/20 ,  G03F7/26 ,  G03F7/36 ,  H01L21/0332 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086

Abstract: A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1:

公开(公告)号：US20160363864A1

公开(公告)日：2016-12-15

申请号：US15172351

申请日：2016-06-03

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Yu-Shin PARK ,  Tae-Ho KIM ,  Yoo-Jeong CHOI ,  Sun-Hae KANG ,  Hyo-Young KWON ,  Sang-Kyun KIM ,  Young-Min KIM ,  Youn-Hee NAM ,  Hyun-Ji SONG ,  Byeri YOON ,  Dong-Geun LEE ,  Seulgi JEONG

IPC: G03F7/11 ,  G03F7/09 ,  G03F7/20 ,  G03F7/32 ,  C08G61/12 ,  C09D165/00

CPC classification number: G03F7/091 ,  C08G10/00 ,  C08G12/00 ,  C08G16/00 ,  C08G61/122 ,  C08G61/124 ,  C08G61/125 ,  C08G61/126 ,  C08G2261/12 ,  C08G2261/3142 ,  C08G2261/3241 ,  C08G2261/3243 ,  C08G2261/3245 ,  C08G2261/3246 ,  C08G2261/3424 ,  C08G2261/344 ,  C09D161/00 ,  C09D161/18 ,  C09D161/20 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/094

Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point. When the carbon cyclic group includes at least two hetero atoms when the carbon cyclic group includes a pentagon cyclic moiety and the pentagon cyclic moiety includes a nitrogen atom (N) as a hetero atom, and the at least two hetero atoms are the same or different:

公开(公告)号：US20160355699A1

公开(公告)日：2016-12-08

申请号：US15076694

申请日：2016-03-22

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Minsoo KIM ,  Younhee NAM ,  Jaeyeol BAEK ,  Hyunji SONG ,  Byeri YOON ,  Seulgi JEONG ,  Seunghee HONG ,  Sunmin HWANG

IPC: C09D161/06 ,  H01L21/033 ,  H01L21/027 ,  G03F7/11

CPC classification number: C09D161/06 ,  C08G8/10 ,  C08G8/20 ,  C08G8/24 ,  G03F7/0752 ,  G03F7/094 ,  H01L21/0332

Abstract: An organic layer composition includes a first compound having a thermal shrinkage ratio of about 10% to about 70%, a second compound having a smaller thermal shrinkage ratio than the first compound, and a solvent, and an organic layer obtained by curing the organic layer composition and a method of forming patterns using the organic layer composition are disclosed.A method of measuring the thermal shrinkage ratio is described in the detailed description.

Abstract translation: 在详细描述中描述了热收缩率的测量方法。