公开(公告)号：US20230076790A1

公开(公告)日：2023-03-09

申请号：US17896782

申请日：2022-08-26

Applicant: SEMES CO., LTD.

Inventor： Kyung Min KIM ,  In Hwang PARK ,  Joo Jib PARK ,  Hyun Jin YANG ,  Ji Hyeong LEE

IPC: B08B15/04 ,  B08B3/02 ,  B08B13/00 ,  B08B3/08

Abstract: According to an embodiment of the present invention, there are provided an exhaust assembly capable of uniformly forming an air flow in an exhaust step of discharging a gas to the outside, and a liquid processing apparatus and substrate processing equipment including the exhaust assembly. According to the present invention, the exhaust assembly that discharges a gas generated in a substrate processing process includes at least two or more intake ports into which the gas flows, a body portion that communicates with the intake ports and provides symmetrical paths for discharging the gas, a guide portion that is installed to guide a flow of the gas at the body portion, and an exhaust port from which the gas is discharged. The guide portion includes a flow guide that is installed to be adjacent to at least one of the intake ports and guides a direction of the gas to equally divide the flow of the gas, and a flow-rate guide that is installed around the intake port most adjacent to the exhaust port among the intake ports and is formed to reduce a cross-sectional area of a flow path of the gas.

公开(公告)号：US20240142171A1

公开(公告)日：2024-05-02

申请号：US18099388

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon OH ,  Ji Hyeong LEE ,  Jin Se PARK ,  Yong Joon IM ,  Young Hun LEE ,  Yong Sun KO

IPC: F26B5/00 ,  F26B21/10 ,  F26B25/00 ,  F26B25/16 ,  G03F7/16

CPC classification number: F26B5/005 ,  F26B21/10 ,  F26B25/003 ,  F26B25/16 ,  G03F7/168

Abstract: A substrate treating apparatus of the present disclosure comprises: a chamber member having an accommodation space configured to accommodate a vessel part where a substrate treatment region constituting a supercritical treatment space are formed, and an opening configured to move the substrate inside or outside; a shutter configured to open or close the chamber member; and a first exhaust part configured to discharge an internal air from the accommodation space to the outside, wherein the temperature of the substrate treatment region is increased.