公开(公告)号：US20230129923A1

公开(公告)日：2023-04-27

申请号：US17971734

申请日：2022-10-24

Applicant: SEMES CO., LTD.

Inventor： Jin Woo JUNG ,  Jin Mo JAE ,  Sang Min LEE ,  Young Hun LEE ,  Yong Hyun CHOI ,  Yong Joon IM ,  Seung Hoon OH

IPC: H01L21/687 ,  H01L21/67 ,  B08B3/04 ,  B08B13/00

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.

公开(公告)号：US20220305536A1

公开(公告)日：2022-09-29

申请号：US17667459

申请日：2022-02-08

Applicant: SEMES CO., LTD.

Inventor： Sang Min LEE ,  Seung Hoon OH ,  Yong Joon IM ,  Hyo Won YANG

IPC: B08B13/00 ,  B08B3/04 ,  F26B5/00

Abstract: A substrate processing apparatus includes a process chamber including a first body and a second body that are coupled to each other to form a processing space therein, a clamping member configured to clamp the first body and the second body, and an anti-friction member mounted in a groove formed in a contact region between the first body or the second body and the clamping member.

公开(公告)号：US20240142171A1

公开(公告)日：2024-05-02

申请号：US18099388

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon OH ,  Ji Hyeong LEE ,  Jin Se PARK ,  Yong Joon IM ,  Young Hun LEE ,  Yong Sun KO

IPC: F26B5/00 ,  F26B21/10 ,  F26B25/00 ,  F26B25/16 ,  G03F7/16

CPC classification number: F26B5/005 ,  F26B21/10 ,  F26B25/003 ,  F26B25/16 ,  G03F7/168

Abstract: A substrate treating apparatus of the present disclosure comprises: a chamber member having an accommodation space configured to accommodate a vessel part where a substrate treatment region constituting a supercritical treatment space are formed, and an opening configured to move the substrate inside or outside; a shutter configured to open or close the chamber member; and a first exhaust part configured to discharge an internal air from the accommodation space to the outside, wherein the temperature of the substrate treatment region is increased.

公开(公告)号：US20220381509A1

公开(公告)日：2022-12-01

申请号：US17825275

申请日：2022-05-26

Applicant: SEMES CO., LTD.

Inventor： Yong Joon IM ,  Sang Min LEE ,  Jong Doo LEE ,  Jin Se PARK

IPC: F26B5/00

Abstract: The present invention provides a substrate treating apparatus, including: a housing including a first body and a second body which are combined with each other to provide a treatment space in which a substrate is treated; an actuator which moves the second body in a vertical direction with respect to the first body to seal or open the treatment space; and a pipe which is coupled with the second body and in which a fluid flows, in which the pipe is a stretchable pipe that is stretchable and contractible according to the vertical movement of the second body.