公开(公告)号：US20230076790A1

公开(公告)日：2023-03-09

申请号：US17896782

申请日：2022-08-26

申请人： SEMES CO., LTD.

发明人： Kyung Min KIM ,  In Hwang PARK ,  Joo Jib PARK ,  Hyun Jin YANG ,  Ji Hyeong LEE

IPC分类号： B08B15/04 ,  B08B3/02 ,  B08B13/00 ,  B08B3/08

摘要： According to an embodiment of the present invention, there are provided an exhaust assembly capable of uniformly forming an air flow in an exhaust step of discharging a gas to the outside, and a liquid processing apparatus and substrate processing equipment including the exhaust assembly. According to the present invention, the exhaust assembly that discharges a gas generated in a substrate processing process includes at least two or more intake ports into which the gas flows, a body portion that communicates with the intake ports and provides symmetrical paths for discharging the gas, a guide portion that is installed to guide a flow of the gas at the body portion, and an exhaust port from which the gas is discharged. The guide portion includes a flow guide that is installed to be adjacent to at least one of the intake ports and guides a direction of the gas to equally divide the flow of the gas, and a flow-rate guide that is installed around the intake port most adjacent to the exhaust port among the intake ports and is formed to reduce a cross-sectional area of a flow path of the gas.

公开(公告)号：US20220246452A1

公开(公告)日：2022-08-04

申请号：US17726721

申请日：2022-04-22

申请人： Semes Co., Ltd

发明人： Sangmin LEE ,  Woo Young KIM ,  Joo Jib PARK ,  Boong KIM

IPC分类号： H01L21/67 ,  H01L21/687 ,  H01L21/673 ,  H01L21/02

摘要： Provided are an apparatus and a method for treating a substrate at a high-pressure atmosphere. The apparatus for treating the substrate includes a first body and a second body combined with each other to define a treatment space in which the substrate is treated, a sealing member interposed between the first body and the second body to seal the treatment space from an outside at a position in which the first body is in close contact with the second body, and a driving member to drive the first body or the second body such that the treatment space is open or closed. The sealing member is positioned in a sealing groove formed in the first body. The sealing member is deformed to be in close contact with the second body by pressure of the treatment space when a process is performed.

公开(公告)号：US20220139731A1

公开(公告)日：2022-05-05

申请号：US17579303

申请日：2022-01-19

申请人： SEMES CO., LTD.

发明人： Joo Jib PARK

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B3/10 ,  B08B3/08 ,  F26B5/00

摘要： A method for treating a substrate, including a solvent processing step of supplying an organic solvent onto the substrate to treat the substrate, a drying step of drying the substrate to remove the organic solvent on the substrate, and a bake step of heating the substrate to thermally decompose an impurity adhering to the substrate, where the drying step and the bake step are performed in different chambers.

公开(公告)号：US20210013064A1

公开(公告)日：2021-01-14

申请号：US16925449

申请日：2020-07-10

申请人： SEMES CO., LTD.

发明人： Dohyeon YOON ,  Joo Jib PARK ,  Jin Se PARK

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B7/00

摘要： An apparatus for treating a substrate includes a light treatment chamber having an interior space, a support unit that supports the substrate in the interior space, and an irradiation unit that irradiates light to the substrate in the interior space to remove organic matter remaining on the substrate, in which the irradiation unit includes a first light source that irradiates first light to the substrate and a second light source that irradiates, to the substrate, second light having a different wavelength range from the first light.

公开(公告)号：US20230178387A1

公开(公告)日：2023-06-08

申请号：US17986936

申请日：2022-11-15

申请人： SEMES CO., LTD.

发明人： Joo Jib PARK

IPC分类号： H01L21/67 ,  H01L21/687 ,  B08B1/00 ,  B08B5/02 ,  B08B13/00 ,  B08B5/04

CPC分类号： H01L21/67017 ,  H01L21/67196 ,  H01L21/67259 ,  H01L21/68707 ,  B08B1/008 ,  B08B5/02 ,  B08B1/002 ,  B08B13/00 ,  B08B5/04

摘要： Provided is an apparatus for treating a substrate, the apparatus including: an index module; and a treating module disposed adjacent to the index module and treating a substrate, in which the treating module includes: one or a plurality of process chambers; a transfer chamber provided with a main transfer robot for transferring a substrate to the process chamber; and a cleaning unit for cleaning a hand of the main transfer robot.

公开(公告)号：US20210111042A1

公开(公告)日：2021-04-15

申请号：US17132008

申请日：2020-12-23

申请人： SEMES CO., LTD.

发明人： Boong KIM ,  Oh Jin KWON ,  Sungho JANG ,  Joo Jib PARK

IPC分类号： H01L21/67 ,  F26B25/14 ,  H01L21/677 ,  H01L21/687

摘要： Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.

公开(公告)号：US20160334162A1

公开(公告)日：2016-11-17

申请号：US15152979

申请日：2016-05-12

申请人： Semes Co., Ltd.

发明人： Boong KIM ,  Min Sung HAN ,  Joo Jib PARK ,  Woo Young KIM

IPC分类号： F26B21/14 ,  F26B3/04 ,  H01L21/02 ,  F26B21/12 ,  H01L21/67 ,  F26B9/06 ,  F26B21/10

CPC分类号： F26B21/145 ,  F26B3/04 ,  F26B9/06 ,  F26B21/10 ,  F26B21/12 ,  F26B21/14 ,  H01L21/02101 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67109 ,  H01L21/6719 ,  H01L21/67248 ,  H01L21/67253

摘要： Disclosed is a substrate drying apparatus of substrate processing apparatus including a chamber that provides a space for processing a substrate, and a fluid supply unit that supplies a process fluid to the chamber, wherein the liquid supply unit includes a supply tank in which the fluid is stored, a supply line that connects the supply tank and the chamber, a branch line branched from a first point of the supply line and connected to a second point of the supply line, and a temperature control unit that adjusts the temperature of the fluid such that the temperatures of the fluids flowing through the supply line and the branch line between the first point and the second point are different.

摘要翻译： 本发明公开了一种基板处理装置的基板干燥装置，其包括：提供用于处理基板的空间的室;以及向该室供给处理流体的流体供给单元，其中，所述液体供给单元包括： 存储有连接供应罐和室的供应管线，从供应管线的第一点分支并连接到供应管线的第二点的分支管线以及调节流体温度的温度控制单元 流经供应管线的流体和第一点与第二点之间的分支管线的温度不同。