公开(公告)号：US20240066564A1

公开(公告)日：2024-02-29

申请号：US18126949

申请日：2023-03-27

Applicant: SEMES CO., LTD.

Inventor： Do Hyung KIM ,  Dae Hun KIM ,  Young Jin KIM ,  Tae Ho KANG ,  Young Joon HAN ,  Eun Hyeok CHOI ,  Jun Gwon LEE

IPC: B08B5/02 ,  B08B3/02 ,  B08B13/00

CPC classification number: B08B5/02 ,  B08B3/022 ,  B08B13/00 ,  F26B21/004

Abstract: Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.