公开(公告)号：US20230215743A1

公开(公告)日：2023-07-06

申请号：US18074454

申请日：2022-12-03

Applicant: SEMES CO., LTD.

Inventor： Young Jin KIM ,  Eunhyeok CHOI ,  Ye Jin CHOI

IPC: H01L21/67 ,  B08B13/00 ,  B08B3/02 ,  H01L21/687

CPC classification number: H01L21/67051 ,  B08B3/022 ,  B08B13/00 ,  H01L21/68764

Abstract: A wafer treatment apparatus includes a wafer supporter for supporting and rotating a wafer, a frontside liquid discharger for discharging a liquid toward a frontside of the wafer, a backside liquid discharger for discharging the liquid toward a backside of the wafer, a treatment chamber for accommodating the wafer supporter, and including liquid collecting inlets stacked on each other and receiving the liquid discharged from at least one of the frontside and backside liquid dischargers, and a controller for controlling a height of an upper end of a first liquid collecting inlet of the liquid collecting inlets to have one of a first height in a process of discharging the liquid to the backside of the wafer adjacent to the wafer supporter and a second height, lower than the first height, in a process of discharging the liquid to the frontside of the wafer.

公开(公告)号：US20230201865A1

公开(公告)日：2023-06-29

申请号：US18145928

申请日：2022-12-23

Applicant: SEMES CO., LTD.

Inventor： Jong Won MOON ,  Kyung Hun LEE ,  Eun Hyeok CHOI ,  Young Jin KIM

IPC: B05C11/10 ,  B05C5/02

CPC classification number: B05C11/1039 ,  B05C5/02

Abstract: Provided is a home port in which a nozzle supplying a treating liquid to a substrate waits. The home port includes a drain cup, a housing provided to cover the drain cup and having an exhaust space exhausting a fume generated from the treating liquid, and an insertion body placed between an upper wall of the housing and the drain cup in the housing. A first exhaust passage guiding the fume to the exhaust space is formed between the insertion body and the drain cup, and a second exhaust passage guiding the fume to the exhaust space is formed between the insertion body and the housing.

公开(公告)号：US20230286713A1

公开(公告)日：2023-09-14

申请号：US17693807

申请日：2022-03-14

Applicant: SEMES CO., LTD.

Inventor： Hyun YOON ,  Ho Jong HWANG ,  Young Jin KIM

IPC: B65D65/38 ,  B08B3/02 ,  B08B13/00

CPC classification number: B65D65/38 ,  B08B3/022 ,  B08B13/00

Abstract: The present invention relates to a bowl including a collection container having an inner surface, and an outer surface disposed opposite to the inner surface, in which a pattern is formed on the inner surface.

公开(公告)号：US20230207355A1

公开(公告)日：2023-06-29

申请号：US18145538

申请日：2022-12-22

Applicant: SEMES CO., LTD.

Inventor： Kun Hee PARK ,  Young Joon HAN ,  Cheol Hwan JEONG ,  Dae Hun KIM ,  Seong Hyun YUN ,  Ye Jin CHOI ,  Eun Hyeok CHOI ,  Tae Ho KANG ,  Young Jin KIM

IPC: H01L21/67 ,  H01L21/687 ,  B08B13/00 ,  B08B3/02 ,  B08B1/00 ,  B08B1/02 ,  B25J15/00 ,  B25J11/00

CPC classification number: H01L21/67207 ,  H01L21/67178 ,  H01L21/67196 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/68764 ,  H01L21/68707 ,  B08B13/00 ,  B08B3/022 ,  B08B1/002 ,  B08B1/02 ,  B25J15/0052 ,  B25J11/0085

Abstract: An apparatus for treating a substrate of the present invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The first transfer chamber, the inversion unit, and the second transfer chamber are sequentially arranged in one direction. The first cleaning chamber is disposed at one side of the first transfer chamber, and the second cleaning chamber is disposed at one side of the second transfer chamber. A first main transfer robot provided in the first transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the first cleaning chamber. The second main transfer robot provided in the second transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the second cleaning chamber.

公开(公告)号：US20240066564A1

公开(公告)日：2024-02-29

申请号：US18126949

申请日：2023-03-27

Applicant: SEMES CO., LTD.

Inventor： Do Hyung KIM ,  Dae Hun KIM ,  Young Jin KIM ,  Tae Ho KANG ,  Young Joon HAN ,  Eun Hyeok CHOI ,  Jun Gwon LEE

IPC: B08B5/02 ,  B08B3/02 ,  B08B13/00

CPC classification number: B08B5/02 ,  B08B3/022 ,  B08B13/00 ,  F26B21/004

Abstract: Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.

公开(公告)号：US20220379355A1

公开(公告)日：2022-12-01

申请号：US17824169

申请日：2022-05-25

Applicant: SEMES CO., LTD.

Inventor： Ye Jin CHOI ,  Cheol Hwan JEONG ,  Young Jin KIM ,  Jong Won MOON

IPC: B08B13/00 ,  B08B3/02

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating container having a treating space; a support unit configured to support and rotate a substrate in the treating space; an exhaust line coupled to the treating container and configured to exhaust an airflow within the treating space; a support frame provided independently of a rotation of the support unit and positioned between the treating container and the support unit; and a guide vane protruding to an outside of the support frame and configured to guide the airflow within the treating space in a downward direction.