公开(公告)号：US20240066564A1

公开(公告)日：2024-02-29

申请号：US18126949

申请日：2023-03-27

Applicant: SEMES CO., LTD.

Inventor： Do Hyung KIM ,  Dae Hun KIM ,  Young Jin KIM ,  Tae Ho KANG ,  Young Joon HAN ,  Eun Hyeok CHOI ,  Jun Gwon LEE

IPC: B08B5/02 ,  B08B3/02 ,  B08B13/00

CPC classification number: B08B5/02 ,  B08B3/022 ,  B08B13/00 ,  F26B21/004

Abstract: Proposed are a substrate processing apparatus and a substrate processing method capable of efficiently preventing contamination of a substrate and a processing space caused by a reverse flow of purge gas.

公开(公告)号：US20230207355A1

公开(公告)日：2023-06-29

申请号：US18145538

申请日：2022-12-22

Applicant: SEMES CO., LTD.

Inventor： Kun Hee PARK ,  Young Joon HAN ,  Cheol Hwan JEONG ,  Dae Hun KIM ,  Seong Hyun YUN ,  Ye Jin CHOI ,  Eun Hyeok CHOI ,  Tae Ho KANG ,  Young Jin KIM

IPC: H01L21/67 ,  H01L21/687 ,  B08B13/00 ,  B08B3/02 ,  B08B1/00 ,  B08B1/02 ,  B25J15/00 ,  B25J11/00

CPC classification number: H01L21/67207 ,  H01L21/67178 ,  H01L21/67196 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/68764 ,  H01L21/68707 ,  B08B13/00 ,  B08B3/022 ,  B08B1/002 ,  B08B1/02 ,  B25J15/0052 ,  B25J11/0085

Abstract: An apparatus for treating a substrate of the present invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The first transfer chamber, the inversion unit, and the second transfer chamber are sequentially arranged in one direction. The first cleaning chamber is disposed at one side of the first transfer chamber, and the second cleaning chamber is disposed at one side of the second transfer chamber. A first main transfer robot provided in the first transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the first cleaning chamber. The second main transfer robot provided in the second transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the second cleaning chamber.