公开(公告)号：US10328441B2

公开(公告)日：2019-06-25

申请号：US15468257

申请日：2017-03-24

Applicant: SEMES CO., LTD.

Inventor： Juyong Jang

IPC: B05B7/22 ,  B05B7/16 ,  C23C24/04 ,  B05B5/03 ,  B05B7/14

Abstract: An embodiment includes a coating apparatus comprising: a support unit for supporting a coating object; and a spray assembly for spraying a fluid which includes a coating material to be coated by the coating object supported on the support unit. The spray assembly comprises: a nozzle unit where the fluid is sprayed; and a fluid supply unit for supplying the fluid to the nozzle unit. The nozzle unit comprises: a body including a passageway for the fluid therein and a dielectric unit provided with a dielectric material; and a plasma source for generating plasma from the fluid which flows to an area adjacent to inner lateral surface of the dielectric unit. The plasma source comprises: a power electrode applying a power; and a ground electrode to be grounded.

公开(公告)号：US11967491B2

公开(公告)日：2024-04-23

申请号：US17177135

申请日：2021-02-16

Applicant: SEMES CO., LTD.

Inventor： Soon-Cheon Cho ,  Su Hyung Lee ,  Youngran Ko ,  Juyong Jang

IPC: H01L21/67 ,  B08B7/00 ,  B08B13/00 ,  H01J37/32

CPC classification number: H01J37/32862 ,  B08B7/0035 ,  B08B13/00 ,  H01J37/3244 ,  H01L21/67034 ,  H01J37/32192 ,  H01J37/32825 ,  H01J2237/002 ,  H01J2237/335

Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.