公开(公告)号：US11856680B2

公开(公告)日：2023-12-26

申请号：US17243954

申请日：2021-04-29

Applicant: SEMES CO., LTD.

Inventor： Sun Whan Kim ,  Byung Du Jeon

IPC: H05F3/02 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  B08B13/00

CPC classification number: H05F3/02 ,  B08B3/02 ,  B08B13/00 ,  H01L21/67051 ,  H01L21/68764 ,  H01L21/67023

Abstract: A substrate processing system capable of setting a stable reference ground level for electrical components while handling electrostatic discharge (ESD) is provided. The substrate processing system includes a first ground bar connected to a building ground; and a second ground bar connected to the building ground and physically separated from the first ground bar, wherein the first ground bar is connected to a first electrical component to set a ground level of the first electrical component, wherein the second ground bar is dedicated to a charged component, and the second ground bar is connected to the first charged component to set a path of the electrostatic discharge current generated by the first charged component.

公开(公告)号：US20210360767A1

公开(公告)日：2021-11-18

申请号：US17243954

申请日：2021-04-29

Applicant: SEMES CO., LTD.

Inventor： Sun Whan Kim ,  Byung Du Jeon

IPC: H05F3/02 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  B08B13/00

Abstract: A substrate processing system capable of setting a stable reference ground level for electrical components while handling electrostatic discharge (ESD) is provided. The substrate processing system includes a first ground bar connected to a building ground; and a second ground bar connected to the building ground and physically separated from the first ground bar, wherein the first ground bar is connected to a first electrical component to set a ground level of the first electrical component, wherein the second ground bar is dedicated to a charged component, and the second ground bar is connected to the first charged component to set a path of the electrostatic discharge current generated by the first charged component.