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公开(公告)号：US20240034055A1
公开(公告)日：2024-02-01
申请号：US18347241
申请日：2023-07-05
Applicant: SEMES CO., LTD.
Inventor： Won Yong JIN , Suk Won JANG
CPC classification number: B41J2/04535 , B41J2/0456 , B41J29/17 , B41J2202/15
Abstract: A droplet analysis unit capable of measuring and digitizing the meniscus shape, motion, and position of ink droplets and a substrate treatment apparatus including the droplet analysis unit are provided. The substrate treatment apparatus includes: a process treatment unit supporting a substrate while the substrate is being treated; an inkjet head unit treating the substrate by ejecting a substrate treatment liquid onto the substrate using a plurality of nozzles; a gantry unit moving the inkjet head unit over the substrate; and a droplet analysis unit measuring a meniscus in each of the nozzles that is associated with the substrate treatment liquid, wherein the droplet analysis unit measures and quantifies three-dimensional (3D) information regarding the meniscus.
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公开(公告)号：US20230063647A1
公开(公告)日：2023-03-02
申请号：US17885552
申请日：2022-08-11
Applicant: SEMES CO., LTD.
Inventor： Han Lim KANG , Suk Won JANG , Jae Duck LEE , Won Yong JIN
Abstract: A meniscus measuring method capable of quickly and accurately measuring meniscus positions in a plurality of nozzles of an inkjet head can be provided. The meniscus measuring method comprises providing a head unit capable of discharging ink through a plurality of nozzles, adhering ink remaining in the plurality of nozzles to a film to form a detection pattern on the film by bringing the film into close contact with the plurality of nozzles, measuring meniscus of ink remaining in the plurality of nozzles based on the detection pattern.
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公开(公告)号：US20240034056A1
公开(公告)日：2024-02-01
申请号：US18346984
申请日：2023-07-05
Applicant: SEMES CO., LTD.
Inventor： Won Yong JIN , Jae Duck LEE , Suk Won JANG
CPC classification number: B41J2/04561 , B41J2/04558 , B41J25/001 , G02B27/0025 , H04N23/631
Abstract: A droplet analysis unit capable of measuring and digitizing the meniscus shape, motion, and position of ink droplets and a substrate treatment apparatus including the droplet analysis unit are provided. The substrate treatment apparatus includes: a process treatment unit supporting a substrate while the substrate is being treated; an inkjet head unit treating the substrate by ejecting a substrate treatment liquid onto the substrate using a plurality of nozzles; a gantry unit moving the inkjet head unit over the substrate; and a droplet analysis unit measuring a meniscus in each of the nozzles that is associated with the substrate treatment liquid, wherein the droplet analysis unit measures and quantifies three-dimensional (3D) information regarding the meniscus based on chromatic aberration.
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公开(公告)号：US20230034437A1
公开(公告)日：2023-02-02
申请号：US17844838
申请日：2022-06-21
Applicant: SEMES CO., LTD.
Inventor： Won Yong JIN , Ho Sang LEE , Suk Won JANG
IPC: B41J2/175
Abstract: A printing apparatus and an ink refill method thereof are provided. The printing apparatus may comprise a printing unit performing printing, and an ink filling unit filling ink in the printing unit in an upward manner, wherein the printing unit includes a printing ink receptor accommodating ink, a spray head spraying the ink, and a pressure controller controlling a pressure of a fluid for operation of the ink, and the ink filling unit includes a supply ink receptor filled with ink for supply to the printing unit, and an ink supply unit mounted on the spray head to supply the ink supplied from the supply ink receptor to the spray head.
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