公开(公告)号：US09978567B2

公开(公告)日：2018-05-22

申请号：US14607816

申请日：2015-01-28

Applicant: SEMES CO., LTD.

Inventor： Yong-Hyun Ham ,  Hyung Je Woo ,  Hyun Joong Kim ,  Wan-Jae Park ,  Kyu Young Han

IPC: H01J37/32 ,  C23C16/44 ,  H01L21/00

CPC classification number: H01J37/32862 ,  C23C16/4401 ,  C23C16/4405 ,  H01J37/32935 ,  H01J37/32972 ,  H01L21/00

Abstract: Provided are an apparatus and a method of treating a substrate using process gas. The apparatus may include a chamber configured to provide a treatment space, in which a process of treating a substrate is performed, a detection unit configured to detect an amount of reaction by-products attached on an inner surface of the chamber. The detection unit may include a window member provided on the inner surface of the chamber, and a light source member configured to emit and receive light through the window member.