公开(公告)号：US09978567B2

公开(公告)日：2018-05-22

申请号：US14607816

申请日：2015-01-28

Applicant: SEMES CO., LTD.

Inventor： Yong-Hyun Ham ,  Hyung Je Woo ,  Hyun Joong Kim ,  Wan-Jae Park ,  Kyu Young Han

IPC: H01J37/32 ,  C23C16/44 ,  H01L21/00

CPC classification number: H01J37/32862 ,  C23C16/4401 ,  C23C16/4405 ,  H01J37/32935 ,  H01J37/32972 ,  H01L21/00

Abstract: Provided are an apparatus and a method of treating a substrate using process gas. The apparatus may include a chamber configured to provide a treatment space, in which a process of treating a substrate is performed, a detection unit configured to detect an amount of reaction by-products attached on an inner surface of the chamber. The detection unit may include a window member provided on the inner surface of the chamber, and a light source member configured to emit and receive light through the window member.

公开(公告)号：US10103018B2

公开(公告)日：2018-10-16

申请号：US13953009

申请日：2013-07-29

Applicant: Semes Co., Ltd.

Inventor： Hyung Joon Kim ,  Seung Pyo Lee ,  Hyung Je Woo

IPC: H01J1/32 ,  C23C16/44 ,  H01L21/02 ,  H01J37/32

Abstract: Provided is a substrate treatment apparatus using plasma. The substrate treatment apparatus includes a housing having an inner space in which a substrate is treated, a support member disposed within the housing to support the substrate, a gas supply unit supplying a gas into the housing, a plasma source generating plasma from the gas supplied into the housing, and a baffle unit disposed to surround the support member within the housing, the baffle unit including a baffle in which through holes for exhausting the gas into the inner space of the housing are defined. The baffle is divided into a plurality of areas when viewed from an upper side, and each of portions of the plurality of areas is formed of a metallic material, and each of the other portions of the plurality of areas is formed of a nonmetallic material.