公开(公告)号：US11845113B2

公开(公告)日：2023-12-19

申请号：US17403063

申请日：2021-08-16

Applicant: SEMES Co., Ltd.

Inventor： Ye Jin Choi ,  Byung Sun Bang ,  Tae Ho Kang ,  Jong Won Moon

IPC: H01L21/67 ,  B08B3/10 ,  B08B3/04 ,  B08B3/08 ,  B08B3/02

CPC classification number: B08B3/10 ,  B08B3/022 ,  B08B3/041 ,  B08B3/08 ,  H01L21/67051

Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.

公开(公告)号：US20220168784A1

公开(公告)日：2022-06-02

申请号：US17403063

申请日：2021-08-16

Applicant: SEMES Co., Ltd.

Inventor： Ye Jin Choi ,  Byung Sun Bang ,  Tae Ho Kang ,  Jong Won Moon

IPC: B08B3/10 ,  B08B3/02 ,  B08B3/08 ,  B08B3/04

Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.