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公开(公告)号:US11511321B2
公开(公告)日:2022-11-29
申请号:US16662020
申请日:2019-10-23
Applicant: SEMES CO., LTD.
Inventor: Young Jin Kim , Jin Tack Yu , Bu Young Jung , Byung Sun Bang , Seung Hoon Oh , Young Jun Choi , Jong Hyeon Woo
Abstract: A substrate processing method includes forming a high surface tension liquid film by supplying high surface tension liquid on a substrate surface, replacing the high surface tension liquid film with low surface tension liquid by supplying the low surface tension liquid to a center area of a substrate so that the low surface tension liquid impinges on the high surface tension liquid film formed on the center area of the substrate, and supplying high surface tension liquid for a predetermined period of time during the supplying the low surface tension liquid.
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2.
公开(公告)号:US11845113B2
公开(公告)日:2023-12-19
申请号:US17403063
申请日:2021-08-16
Applicant: SEMES Co., Ltd.
Inventor: Ye Jin Choi , Byung Sun Bang , Tae Ho Kang , Jong Won Moon
CPC classification number: B08B3/10 , B08B3/022 , B08B3/041 , B08B3/08 , H01L21/67051
Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.
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公开(公告)号:US11361962B2
公开(公告)日:2022-06-14
申请号:US16673267
申请日:2019-11-04
Applicant: SEMES CO., LTD.
Inventor: Seung Hoon Oh , Jin Tack Yu , Bu Young Jung , Byung Sun Bang , Young Jin Kim , Young Jun Choi , Jong Hyeon Woo
IPC: H01L21/02 , G03F7/16 , H01L21/687 , H01L21/67
Abstract: An embodiment of the present invention provides a substrate processing method. The substrate processing method, which performs a liquid processing process by injecting a processing liquid on a substrate on a spin chuck disposed inside a plurality of recovery cups that are disposed in multiple layers, includes: in a transitional period of time in which height change of any one of the recovery cups occurs, adjusting rotational speed of the spin chuck, which is configured to support the substrate, in conjunction with the height change of the recovery cup.
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4.
公开(公告)号:US20220168784A1
公开(公告)日:2022-06-02
申请号:US17403063
申请日:2021-08-16
Applicant: SEMES Co., Ltd.
Inventor: Ye Jin Choi , Byung Sun Bang , Tae Ho Kang , Jong Won Moon
Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.
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