公开(公告)号：US20220275241A1

公开(公告)日：2022-09-01

申请号：US17637622

申请日：2020-06-09

Applicant: SHOWA DENKO K.K.

Inventor： Kentaro FURUE ,  Yoshikazu ARAI

IPC: C09D163/04 ,  C09D133/14 ,  C09D7/41 ,  C09D7/63 ,  H01L51/52

Abstract: The present invention reduces inhibition of light sensitization of a photosensitive resin composition containing a black dye and increases sensitivity by improving pattern forming ability. The photosensitive resin composition according to one embodiment of the present invention contains a binder resin (A), a radiation-sensitive compound (B), and a dye (C), wherein the dye (C) contains a black dye (C1) and a dye (C2) other than (C1), the dye (C2) has an absorption maximum at a wavelength of 480-550 nm in an wavelength range of 300-800 nm, and, when the absorbance of the dye (C2) at the absorption maximum wavelength is defined as Abs1 and the average absorbance of the dye (C2) at wavelengths 560-600 nm is defined as Abs2, Abs2/Abs1 equals 0.1-1.0.

公开(公告)号：US20220221790A1

公开(公告)日：2022-07-14

申请号：US17613384

申请日：2020-01-30

Applicant: SHOWA DENKO K.K.

Inventor： Yoshikazu ARAI

IPC: G03F7/023 ,  G03F7/32 ,  G03F7/004 ,  G03F7/038 ,  G03F7/00

Abstract: A highly-sensitive photosensitive resin composition contains a coloring agent, and can inhibit a coating from coming off in a development step. The photosensitive resin composition according to an embodiment of the present invention contains a binder resin (A), a compound (B) having a triazine ring and represented by formula (1), a radiation-sensitive compound (C), and a coloring agent (D) selected from the group consisting of black dyes and black pigments. In formula (1), R1, R2, and R3 each independently represent a hydroxy group, an alkyl group having 1-5 carbon atoms, an alkenyl group having 2-6 carbon atoms, an alkenyl ether group having 2-6 carbon atoms, an optionally substituted amino group, a halogenated alkyl group, a sulfide group, a mercapto group, a phenyl group, a phenyl ether group, a halogeno group, a naphthyl group, a pyridyl group, a biphenyl group, a morpholino group, a fluorene group, or a carbazole group.

公开(公告)号：US20220326614A1

公开(公告)日：2022-10-13

申请号：US17596046

申请日：2020-06-03

Applicant: SHOWA DENKO K.K.

Inventor： Yasuhiro ISHIDA ,  Kentaro FURUE ,  Yoshikazu ARAI ,  Mitsuhiro IWASAKI ,  Hideo HORIBE

IPC: G03F7/039 ,  H01L51/00 ,  H01L51/52

Abstract: Provided is a high-sensitive photosensitive resin composition which contains a black colorant and by which development and pattern formation are possible even with a low exposure amount. A positive-type photosensitive resin composition according to one embodiment contains: a first resin (A) having a plurality of phenolic hydroxyl groups, at least some of which are protected with an acid-labile group; a second resin (B) having an epoxy group and a phenolic hydroxyl group; at least one colorant (C) selected from the group consisting of a black dye and a black pigment; and a photoacid generator (D).

公开(公告)号：US20130307195A1

公开(公告)日：2013-11-21

申请号：US13872384

申请日：2013-04-29

Applicant: SHOWA DENKO K.K.

Inventor： Yoshikazu ARAI ,  Hiroshi UCHIDA

IPC: B29D17/00

CPC classification number: B29D17/00 ,  C08F220/40 ,  C08G77/045 ,  C08G77/14 ,  C08G77/38 ,  G11B5/855

Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group.

Abstract translation: 本发明的目的是提供一种转印材料用固化性组合物。 该可固化组合物可应用于能够形成具有高通量的微图案的UV纳米压印法，在一些情况下可应用于热纳米压印工艺，并且能够形成对氟基气体和 氧气 用于转移材料的可固化组合物包括在其分子中具有特定倍半硅氧烷骨架和可固化官能团的含硅倍半硅氧烷骨架的化合物。