Memory element and manufacturing method of memory element

    公开(公告)号:US10734386B2

    公开(公告)日:2020-08-04

    申请号:US16086999

    申请日:2017-03-06

    Abstract: To further improve reliability as an element for the memory element. Provided is a memory element including: a plurality of magnetoresistive elements having an MTJ structure that are arrayed on a substrate. There is a region in which magnetism is neutralized in a region of a magnetic material layer that functions as a storage layer in the magnetoresistive element other than a region that functions as the magnetoresistive element, and the region in which magnetism is neutralized includes an alloy containing a first element constituting the magnetic material layer and a second element having an fcc structure when forming an alloy with the first element.

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