公开(公告)号：US20190214233A1

公开(公告)日：2019-07-11

申请号：US16172863

申请日：2018-10-29

Applicant: Samsung Display Co., Ltd.

Inventor： Soo Beom JO ,  Hae Young YOO ,  Ju Hee LEE ,  Yong Mun CHANG ,  Myung Soo HUH

IPC: H01J37/32 ,  H01L21/3065

CPC classification number: H01J37/32238 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/3222 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32724 ,  H01J37/32834

Abstract: A plasma processing device including a chamber, a plurality of dielectric windows covering a top portion of the chamber, a lid frame supporting the dielectric windows on a same plane, a plurality of supporting bars supporting a top portion of the lid frame, and a plurality of antennas positioned above the dielectric windows, in which the antennas include a first antenna positioned inside an area defined by the supporting bars and having a loop form, and a second antenna positioned outside the area defined by the supporting bars and having a loop form, and a first current direction in the first antenna and a second current direction in the second antenna are the same as each other.

公开(公告)号：US20240420928A1

公开(公告)日：2024-12-19

申请号：US18602334

申请日：2024-03-12

Applicant: Samsung Display Co., Ltd.

Inventor： Eun Chan LIM ,  Hae Young YOO ,  Eun Soo LEE ,  Seon Uk PARK ,  Yong Mun CHANG ,  Hyun Ku PARK ,  Jae Ryong LEE

IPC: H01J37/32

Abstract: A plasma shield assembly may include a guide component including first through holes connected to plasma generators that generate radicals using process gas, and a shield component detachably coupled to the guide component and disposed on a lower surface of the guide component, and including second through holes aligned with the first through holes to pass the radicals from the first through holes. The shield component may be spaced apart from the lower surface of the guide component with a gap formed between the shield component and the guide component. Bumper rings disposed adjacent to the second through holes to prevent the radicals from entering the gap.